Mr. Takeo Hashimoto Profile

Takeo Hashimoto

Chief Researcher at ASET

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Author

Publications (6)

Proceedings Article | 28 June 2005 Paper

Investigation of defect repair methods for EUVL mask blanks through aerial-image simulations

Takeo Hashimoto, Iwao Nishiyama

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617268

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Inspection, Semiconducting wafers, Reflectivity, Finite-difference time-domain method, Chromium, Silicon, Extreme ultraviolet, Molybdenum

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Proceedings Article | 6 May 2005 Paper

Simulation analysis of defect repair methods for EUVL Mo/Si multilayer mask blanks

Takeo Hashimoto, Iwao Nishiyama

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599224

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Reflectivity, Inspection, Semiconducting wafers, Extreme ultraviolet, Finite-difference time-domain method, Chromium, Silicon, Analytical research

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Proceedings Article | 6 May 2005 Paper

Evaluation of pattern fidelity in EUVL using a high-numerical-aperture small-field EUV exposure tool (HiNA)

Yuusuke Tanaka, Hiroaki Oizumi, Takeo Hashimoto, Fumiaki Kumasaka, Iwao Nishiyama, Tsukasa Abe, Hiroshi Mohri, Naoya Hayashi

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599050

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Optical proximity correction, Projection systems, Wavefronts, Image processing, Printing, Extreme ultraviolet, Optical lithography, Semiconducting wafers

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Proceedings Article | 20 August 2004 Paper

Visible-light inspection of EUVL multilayer mask blanks

Takeo Hashimoto, Hiromasa Yamanashi, Shinji Miyagaki, Iwao Nishiyama

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557772

KEYWORDS: Inspection, Optical spheres, Photomasks, Silicon, Surface roughness, Extreme ultraviolet lithography, Particles, Photonics, Particle systems, Interference (communication)

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Proceedings Article | 20 May 2004 Paper

Effect of absorber material and mask pattern correction on pattern fidelity in EUV lithography

Minoru Sugawara, Takeo Hashimoto, Iwao Nishiyama

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.534981

KEYWORDS: Photomasks, Mass attenuation coefficient, Near field, Optical testing, Mineralogy, Reflectivity, Semiconducting wafers, Refractive index, Tantalum, Extreme ultraviolet lithography

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Proceedings Article | 20 May 2004 Paper

Lithographic characterization of EUVL mask blank defects

Takeo Hashimoto, Hiromasa Yamanashi, Minoru Sugawara, Iwao Nishiyama

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.534692

KEYWORDS: Photomasks, Inspection, Extreme ultraviolet lithography, Defect detection, Lithography, Phase shifts, Molybdenum, Silicon, Sputter deposition, Electron beams

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Showing 5 of 6 publications

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