Dr. Tae-Hwan Oh Profile

Dr. Tae-Hwan Oh

Principal Engineer at SAMSUNG Electronics Co Ltd

SPIE Involvement:

Author

Publications (10)

Proceedings Article | 21 November 2023 Presentation + Paper

Analysis method to define photoresist resolution in EUV lithography

Yongbeom Seo, Heeyoung Go, Jinseong Lee, Taehwan Oh, Donghun Shin, Huiseob Shin, Jisun Lee, Sangjin Kim, In-sung Kim, Changmin Park

Proceedings Volume 12750, 127500B (2023) https://doi.org/10.1117/12.2687461

KEYWORDS: Extreme ultraviolet lithography, Critical dimension metrology, Stochastic processes, Optical lithography, Bridges, Scanning electron microscopy, Resistance, Photoresist materials, Extreme ultraviolet, Metals

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Proceedings Article | 24 March 2017 Presentation + Paper

Single-expose patterning development for EUV lithography

Anuja De Silva, Karen Petrillo, Luciana Meli, Jeffrey Shearer, Genevieve Beique, Lei Sun, Indira Seshadri, Taehwan Oh, Seulgi Han, Nicole Saulnier, Joe Lee, John Arnold, Bassem Hamieh, Nelson Felix, Tsuyoshi Furukawa, Lovejeet Singh, Ramakrishnan Ayothi

Proceedings Volume 10143, 101431G (2017) https://doi.org/10.1117/12.2261216

KEYWORDS: Optical lithography, Extreme ultraviolet lithography, Extreme ultraviolet, Lithography, Materials processing, Photoresist processing, Etching, Metals, Quantum efficiency, Photoresist materials, Interfaces, Silicon

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Proceedings Article | 29 March 2013 Paper

Negative tone imaging (NTI) with KrF: extension of 248nm IIP lithography to under sub-20nm logic device

Tae-Hwan Oh, Tae-Sun Kim, Yura Kim, Jahee Kim, Sujeong Heo, Bumjoon Youn, Jaekyung Seo, Kwang-Sub Yoon, Byoung-il Choi

Proceedings Volume 8682, 86820P (2013) https://doi.org/10.1117/12.2011426

KEYWORDS: Photoresist processing, Lithography, Photomasks, Optical lithography, Logic devices, Image processing, Ion implantation, Chemically amplified resists, Scanning electron microscopy, Nanoimprint lithography

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Proceedings Article | 31 March 2010 Paper

Noble design of Si-SOH in trilayer resist process for sub-30-nm logic device

Tae-Hwan Oh, Yunsuk Nam, Chansam Chang, Suhyun Kim, Minkeun Kwak, Dongsu Kim, Hongjae Shin, Nae-In Lee, Jongshik Yoon

Proceedings Volume 7639, 763927 (2010) https://doi.org/10.1117/12.846478

KEYWORDS: Photoresist processing, Silicon, Lithography, Critical dimension metrology, Immersion lithography, Silicon carbide, Carbon, Logic devices, Control systems, Photomasks

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Proceedings Article | 19 May 2009 Paper

Modified trilayer resist approach for ArF immersion lithography

Tae-Hwan Oh, Yunsuk Nam, Suhyun Kim, Minkeun Kwak, Hyungsam Choi, Chansam Chang, Yongchul Kim, Hong-Jae Shin, Nae-In Lee

Proceedings Volume 7273, 727314 (2009) https://doi.org/10.1117/12.814013

KEYWORDS: Head-mounted displays, Silicon, Photoresist processing, Coating, Lithography, Immersion lithography, Semiconducting wafers, Advanced distributed simulations, Carbon, Silicon carbide

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Proceedings Article | 29 March 2006 Paper

Negative nanomolecular resists based on calix[4]resorcinarene

Tae-Hwan Oh, Ramakrishnan Ganesan, Je-Moon Yoon, Jin-Baek Kim

Proceedings Volume 6153, 61532G (2006) https://doi.org/10.1117/12.660111

KEYWORDS: Epoxies, Silicon, Semiconducting wafers, Lithography, Photoresist materials, Etching, Scanning electron microscopy, Near ultraviolet, Cesium, Chemistry

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Proceedings Article | 4 May 2005 Paper

Bilayer resists based on polyhedral oligomeric silsesquioxane for 193-nm lithography

Ramakrishnan Ganesan, Jae-Hak Choi, Hyo-Jin Yun, Young-Gil Kwon, Kyoung-Seon Kim, Tae-Hwan Oh, Jin-Baek Kim

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599622

KEYWORDS: Lithography, Silicon, Ultraviolet radiation, Absorbance, Standards development, Polymers, Semiconducting wafers, Sodium, Photomicroscopy, Solids

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