Dr. Tab Stephens Profile

Dr. Tab Stephens

Senior Member of Technical Staff

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Author

Publications (4)

Proceedings Article | 5 April 2007 Paper

Improved dimension and shape metrology with versatile atomic force microscopy

Mark Caldwell, Tianming Bao, John Hackenberg, Brian McLain, Omar Munoz, Tab Stephens, Victor Vartanian

Proceedings Volume 6518, 65181L (2007) https://doi.org/10.1117/12.708813

KEYWORDS: Atomic force microscopy, Etching, Critical dimension metrology, 3D metrology, Metrology, Copper, Semiconducting wafers, Scanning electron microscopy, Process control, Transmission electron microscopy

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Proceedings Article | 4 May 2005 Paper

A novel contact hole shrink process for the 65-nm-node and beyond

Richard Peters, Patrick Montgomery, Cesar Garza, Stanley Filipiak, Tab Stephens, Dan Babbitt

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599918

KEYWORDS: Photoresist processing, Cadmium sulfide, Fluorine, Optical lithography, Thermal effects, Scanning electron microscopy, Critical dimension metrology, Semiconducting wafers, Polymers, Semiconductors

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Proceedings Article | 12 June 2003 Paper

Fabrication of integrated circuits with high yield using ultrathin resist processes

Richard Peters, Sergei Postnikov, Jonathan Cobb, S. Dakshina-Murthy, Tab Stephens, Colita Parker, Eric Luckowski, Arturo Martinez, Wei Wu, Scott Hector

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485122

KEYWORDS: Photoresist processing, Transistors, Etching, Semiconducting wafers, Plasma etching, Plasma, Silicon, Resistance, Defect inspection, Optical lithography

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Proceedings Article | 12 June 2003 Paper

Controlling line-edge rougness to within reasonable limits

Jonathan Cobb, Shahid Rauf, Aaron Thean, S. Dakshina-Murthy, Tab Stephens, Colita Parker, Richard Peters, Vivek Rao

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485169

KEYWORDS: Line edge roughness, Etching, 3D modeling, Diffusion, Process modeling, Instrument modeling, Photoresist processing, Photoresist materials, Edge roughness, Image processing

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