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Sylvie Eckert
at DuPont Electronics & Industrial
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Publications (3)
Proceedings Article | 10 April 2024 Presentation + Paper
Advanced EUV CAR small molecule compounds design and its impact to etch performance
Yinjie Cen, Jong Keun Park, Suzanne Coley, Benjamin Naab-Rafael, Li Cui, Emad Aqad, Stefan Alexandrescu, Rochelle Rena, Sylvie Eckert, Jason Behnke, ChoongBong Lee, Karen Petrillo
Proceedings Volume 12957, 129570A (2024) https://doi.org/10.1117/12.3010931
KEYWORDS: Etching, Photoresist materials, Extreme ultraviolet lithography
Proceedings Article | 9 April 2024 Paper
Impact of increasing EUV absorption of CAR polymers on lithographic performance
Yinjie Cen, Emad Aqad, Li Cui, Suzanne Coley, Jong Keun Park, Benjamin Naab-Rafael, Rochelle Rena, Tyler Paul, Sylvie Eckert, Chunyi Wu, Mike Finch, Jason Behnke, ChoongBong Lee, Karen Petrillo
Proceedings Volume 12957, 129571Z (2024) https://doi.org/10.1117/12.3010961
KEYWORDS: Polymers, Extreme ultraviolet, Absorption, Extreme ultraviolet lithography, Photoresist materials, Line width roughness, Lithography
Proceedings Article | 9 April 2024 Poster + Paper
Identifying trends in photoresist polymer properties to improve line and space defects
Benjamin Rafael-Naab, Jong Keun Park, Emad Aqad, Yinjie Cen, Suzanne Coley, Li Cui, Conner Hoelzel, Choong Bong Lee, Jason Behnke, Rochelle Rena, Sylvie Eckert, Stefan Alexandrescu, K. A. Niradha Sachinthani, Michael Finch, Karen Petrillo, Li Cheng
Proceedings Volume 12957, 129571S (2024) https://doi.org/10.1117/12.3010493
KEYWORDS: Defect inspection, Photoresist materials, Polymers, Line width roughness, Extreme ultraviolet lithography, Photoacid generators, Semiconducting wafers
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