Dr. Steven Verhaverbeke Profile

Dr. Steven Verhaverbeke

at Applied Materials Inc

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Publications (2)

Proceedings Article | 21 June 2006 Paper

Advanced processes for photomask damage-free cleaning and photoresist removal

James Papanu, Roman Gouk, Han-Wen Chen, Pieter Boelen, Phillip Peters, Michael Belisle, Steven Verhaverbeke, Alexander Ko, Kent Child, Elias Martinez

Proceedings Volume 6281, 62810K (2006) https://doi.org/10.1117/12.692644

KEYWORDS: Chemistry, Particles, Photomasks, Photoresist materials, Reflectivity, Photoresist processing, Chromium, Ozone, Photoresist developing, Attenuators

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Proceedings Article | 5 November 2005 Paper

Advanced mask cleaning techniques for sub-100-nm technology nodes

James Papanu, Roman Gouk, Cole Franklin, Han-Wen Chen, Steven Verhaverbeke, Alexander Ko, Kent Child, Pieter Boelen, Suresh Shrauti, Elias Martinez, Brian Brown

Proceedings Volume 5992, 59921G (2005) https://doi.org/10.1117/12.632294

KEYWORDS: Particles, Photomasks, Chemistry, Chromium, Photoresist materials, Mask cleaning, Photoresist processing, Plasma, Phase shifts, Transmittance

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