CONFERENCE PROCEEDINGS
Advanced Search
Stéphanie Audran
at STMicroelectronics
SPIE Involvement:
Author
Publications (4)
Proceedings Article | 1 November 2022 Paper
OPC flow for non-conventional layouts: specific application to optical diffusers
Elodie Sungauer, Stephanie Audran, Simon Guillaumet, Delia Ristoiu
Proceedings Volume 12472, 124720T (2022) https://doi.org/10.1117/12.2639563
KEYWORDS: Optical proximity correction, Photomasks, SRAF, Etching, Sensors, Semiconducting wafers, Model-based design, Diffusers, Optical components, Resolution enhancement technologies
Proceedings Article | 10 March 2021 Presentation + Paper
Pattern placement and shape distortion control using contour-based metrology
Bertrand Le Gratiet, Régis Bouyssou, Julien Ducoté, Alain Ostrovsky, Stephanie Audran, Christian Gardin, Nivea Schuch, Charles Valade, Jordan Belissard, Matthieu Millequant, Thiago Figueiro, Patrick Schiavone
Proceedings Volume 11611, 116110Z (2021) https://doi.org/10.1117/12.2584364
KEYWORDS: Metrology, Critical dimension metrology, Overlay metrology, Distortion, Etching, Visualization, Semiconducting wafers, Scanning electron microscopy, Image processing, Electron microscopes
Proceedings Article | 30 March 2010 Paper
Grayscale lithography process study applied to zero-gap microlenses for sub-2μm CMOS image sensors
S. Audran, J. Vaillant, V. Farys, F. Hirigoyen, E. Huss, B. Mortini, C. Cowache, L. Berthier, E. Mortini, J. Fantuz, O. Arnaud, L. Depoyan, F. Sundermann, C. Baron, J.-P. Reynard
Proceedings Volume 7639, 763910 (2010) https://doi.org/10.1117/12.846507
KEYWORDS: Microlens, Photomasks, Calibration, Spherical lenses, Atomic force microscopy, Grayscale lithography, Image processing, Photoresist processing, Photoresist materials, Diffusion
Proceedings Article | 29 March 2006 Paper
Study of dynamical formation and shape of microlenses formed by the reflow method
S. Audran, B. Faure, B. Mortini, C. Aumont, R. Tiron, C. Zinck, Y. Sanchez, C. Fellous, J. Regolini, J. Reynard, G. Schlatter, G. Hadziioannou
Proceedings Volume 6153, 61534D (2006) https://doi.org/10.1117/12.656371
KEYWORDS: Microlens, Polymers, Spherical lenses, Atomic force microscopy, Plasma treatment, Photoresist materials, Modeling, Photoresist processing, Semiconducting wafers, Temperature metrology
SIGN IN TO:
  • View contact details
UPDATE YOUR PROFILE
Is this your profile? Update it now.
Sign into your SPIE.org account
Don’t have a profile and want one?
Create an account on SPIE.org
Advertisement
Advertisement
Back to Top