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Dr. Stephan Heil
Team Lead at ASML Netherlands BV
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Publications (1)
Proceedings Article | 13 March 2018 Presentation + Paper
Scanner focus metrology and control system for advanced 10nm logic node
Junghun Oh, Kwang-Seok Maeng , Jae-Hyung Shin, Won-Woong Choi, Sung-Keun Won, Cedric Grouwstra, Mohamed El Kodadi, Stephan Heil, Vidar van der Meijden, Jong Kyun Hong , Sang-Jin Kim, Oh-Sung Kwon
Proceedings Volume 10585, 105851O (2018) https://doi.org/10.1117/12.2297442
KEYWORDS: Scanners, Semiconducting wafers, Metrology, Control systems, Interfaces, Logic, Critical dimension metrology, Lithography, High volume manufacturing, Environmental monitoring
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