Dr. Sinjeung Park Profile

Dr. Sinjeung Park

at SAMSUNG Electronics Co Ltd

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 21 November 2023 Presentation + Paper

Deep learning-based detection of mask rule check violations in curvilinear mask

Sooyong Lee, Jeeyong Lee, Sinjeung Park, Byungjun Kang, Juyun Park, Bongkeun Kim, Joonsung Kim, Seung-Hune Yang, Seongtae Jeong

Proceedings Volume 12751, 1275109 (2023) https://doi.org/10.1117/12.2685488

KEYWORDS: Transformers, Visualization, Design and modelling, Deep learning, Image classification, Data modeling

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Proceedings Article | 22 March 2016 Paper

Requirements of the e-beam shot quality for mask patterning of the sub-1X device

Sinjeung Park, Jongmun Park, Boram Lee, Jin Choi, In Kyun Shin, Chan-Uk Jeon

Proceedings Volume 9777, 977716 (2016) https://doi.org/10.1117/12.2218340

KEYWORDS: Photomasks, Optical proximity correction, Electron beam lithography, Critical dimension metrology, Vestigial sideband modulation, Diamond patterning, Semiconducting wafers, Scanning electron microscopy, Optical lithography, Lithography

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Proceedings Article | 9 July 2015 Paper

Challenges and requirements of mask data processing for multi-beam mask writer

Jin Choi, Dong Hyun Lee, Sinjeung Park, SookHyun Lee, Shuichi Tamamushi, In Kyun Shin, Chan Uk Jeon

Proceedings Volume 9658, 96580C (2015) https://doi.org/10.1117/12.2199274

KEYWORDS: Photomasks, Data corrections, Optical proximity correction, Data processing, Data modeling, Scattering, Logic devices, Modulation, Laser scattering, Optical lithography

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Proceedings Article | 21 March 2008 Paper

Nano patterning with a single high-transmission nano-metal aperture system

Yongwoo Kim, Sinjeung Park, Eungman Lee, Jae Hahn

Proceedings Volume 6921, 69212C (2008) https://doi.org/10.1117/12.774485

KEYWORDS: Metals, Lithography, Optical lithography, Near field optics, Aluminum, Near field, Light sources, Objectives, Microscopes, Solids

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Proceedings Article | 15 March 2007 Paper

Design of metal slits for higher harmonic fringe patterns generated with surface plasmon interference lithography

Yunmi Lee, Sinjeung Park, Eungman Lee, Kyoungsik Kim, Jae Hahn

Proceedings Volume 6517, 651722 (2007) https://doi.org/10.1117/12.712522

KEYWORDS: Aluminum, Surface plasmons, Polymethylmethacrylate, Metals, Lithography, Photomasks, Fringe analysis, Photoresist materials, Light wave propagation, Finite-difference time-domain method

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