Mr. Shun-ichi Kodama Profile

Shun-ichi Kodama

Research at AGC Inc

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Author

Publications (3)

Proceedings Article | 12 June 2003 Paper

Dry-etching resistance of fluoropolymers for 157-nm single-layer resists

Yasuhide Kawaguchi, Jun Irisawa, Shun-ichi Kodama, Shinji Okada, Yoko Takebe, Isamu Kaneko, Osamu Yokokoji, Seiichi Ishikawa, Shigeo Irie, Takuya Hagiwara, Toshiro Itani

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.483735

KEYWORDS: Polymers, Resistance, Etching, Chemical species, Fluorine, Transparency, Absorption, Lithography, Semiconducting wafers, Gases

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Proceedings Article | 12 June 2003 Paper

Performances of resists for 157-nm lithography based on monocyclic fluoropolymers

Seiichi Ishikawa, Shigeo Irie, Toshiro Itani, Yasuhide Kawaguchi, Osamu Yokokoji, Shun-ichi Kodama

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485051

KEYWORDS: Polymers, Lithography, Absorption, Resistance, Fluorine, Photomasks, Transparency, Polymer thin films, Silicon, Semiconducting wafers

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Proceedings Article | 24 July 2002 Paper

Synthesis of novel fluoropolymers for 157-nm photoresists by cyclopolymerization

Shun-ichi Kodama, Isamu Kaneko, Yoko Takebe, Shinji Okada, Yasuhide Kawaguchi, Naomi Shida, Seiichi Ishikawa, Minoru Toriumi, Toshiro Itani

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474160

KEYWORDS: Polymers, Polymerization, Glasses, Transparency, Photoresist materials, Lithography, Phase shifts, Photomasks, Manganese, Fluorine

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