CONFERENCE PROCEEDINGS
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Shintaro Kudo
at Nikon Corp
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Author
Publications (3)
Proceedings Article | 31 March 2014 Paper
Scanner performance predictor and optimizer in further low-k1 lithography
Hajime Aoyama, Toshiharu Nakashima, Taro Ogata, Shintaro Kudo, Naonori Kita, Junji Ikeda, Ryota Matsui, Hajime Yamamoto, Ayako Sukegawa, Katsushi Makino, Masayuki Murayama, Kazuo Masaki, Tomoyuki Matsuyama
Proceedings Volume 9052, 90520A (2014) https://doi.org/10.1117/12.2046547
KEYWORDS: Reticles, Photomasks, Scanners, Critical dimension metrology, Semiconducting wafers, Lithography, Electroluminescence, Error analysis, Distortion, Data modeling
Proceedings Article | 20 May 2011 Paper
22nm node ArF lithography performance improvement by utilizing mask 3D topography: controlled sidewall angle
Hiroshi Watanabe, Kei Mesuda, Katsuya Hayano, Eiji Tsujimoto, Hideyoshi Takamizawa, Toshio Ohhashi, Naruo Sakasai, Shintaro Kudo, Tomoyuki Matsuyama
Proceedings Volume 8081, 808108 (2011) https://doi.org/10.1117/12.899910
KEYWORDS: Photomasks, Lithography, Semiconducting wafers, Printing, Chromium, Etching, Resolution enhancement technologies, Source mask optimization, Binary data, Critical dimension metrology
Proceedings Article | 20 May 2011 Paper
Mask blank material optimization impact on leading-edge ArF lithography
Kei Mesuda, Hiroshi Watanabe, Katsuya Hayano, Eiji Tsujimoto, Hideyoshi Takamizawa, Toshio Ohhashi, Naruo Sakasai, Shintaro Kudo, Tomoyuki Matsuyama
Proceedings Volume 8081, 808102 (2011) https://doi.org/10.1117/12.899909
KEYWORDS: Lithography, Photomasks, Source mask optimization, SRAF, Resolution enhancement technologies, Head, Error analysis, Refractive index, Scanning electron microscopy, Lithographic illumination
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