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Dr. Shin-ichi Hamaguchi
at Advantest Corp
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Publications (1)
Proceedings Article | 28 June 2013 Paper
Next generation electron beam lithography system F7000 for wide range applications
Hirofumi Hayakawa, Masahiro Takizawa, Masaki Kurokawa, Akiyoshi Tsuda, Masami Takigawa, Shin-ichi Hamaguchi, Akio Yamada, Kiichi Sakamoto, Takayuki Nakamura
Proceedings Volume 8701, 870103 (2013) https://doi.org/10.1117/12.2029193
KEYWORDS: Semiconducting wafers, Silicon, Electron beam lithography, Photomasks, Microelectromechanical systems, Photonics, Nanofabrication, Glasses, Vestigial sideband modulation, Electron beams
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