Mr. Shigeru Nakajima Profile

Shigeru Nakajima

at Tokyo Electron AT Ltd

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Author

Publications (3)

Proceedings Article | 30 March 2010 Paper

Novel approaches to controlling photo-resist CD in double patterning processes

Kazuo Yabe, Kazuhide Hasebe, Shigeru Nakajima, Hiroki Murakami, Arisa Hara, Shoichi Yamauchi, Sakurako Natori, Kenichi Oyama, Hidetami Yaeasghi

Proceedings Volume 7639, 76391U (2010) https://doi.org/10.1117/12.846468

KEYWORDS: Double patterning technology, Etching, Line width roughness, Photomasks, Lithography, Photoresist processing, Critical dimension metrology, Resolution enhancement technologies, Extreme ultraviolet lithography, Oxygen

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Proceedings Article | 26 March 2010 Paper

The important challenge to extend spacer DP process towards 22nm and beyond

Kenichi Oyama, Eiichi Nishimura, Masato Kushibiki, Kazuhide Hasebe, Shigeru Nakajima, Hiroki Murakami, Arisa Hara, Shohei Yamauchi, Sakurako Natori, Kazuo Yabe, Tomohito Yamaji, Ryota Nakatsuji, Hidetami Yaegashi

Proceedings Volume 7639, 763907 (2010) https://doi.org/10.1117/12.845970

KEYWORDS: Stationary wavelet transform, Double patterning technology, Etching, Silica, Photomasks, Lithography, Photoresist processing, Logic, Fabrication, Reactive ion etching

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Proceedings Article | 11 December 2009 Paper

Implementation of double patterning process toward 22-nm node

Hidetami Yaegashi, Eiichi Nisimura, Kazuhide Hasebe, Tetsu Kawasaki, Masato Kushibiki, Arisa Hara, Shoichi Yamauchi, Sakurako Natori, Nakajima Shigeru, Hiroki Murakami, Kazuo Yabe, Satoru Shimura, Fumiko Iwao, Kenichi Oyama

Proceedings Volume 7520, 75201E (2009) https://doi.org/10.1117/12.839826

KEYWORDS: Double patterning technology, Photoresist processing, Silica, Resolution enhancement technologies, Photoresist materials, Etching, Line width roughness, Lithography, Atomic layer deposition, Optical lithography

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