In this work we report the design and characterization of a Shack-Hartmann wavefront sampling plane based on a microlens array (MLA) composed of 12 X 12 hexagonal contiguous diffractive lenslet, with 355 μm pitch, 4.5 mm focal length, and 4.3 X 4.3 mm lateral dimensions. The device was fabricated by maskless grayscale lithography based on Digital Light Projector (DLP) technology. Optical characterization was performed in order to measure wavefront aberrations in Zernike polynomials terms. Intraocular lenses were used as test elements because they yield well-known optical aberrations, such as defocus and spherical aberration. For the wavefront reconstruction, the modal approach was used, in which the first derivatives of Zernike polynomials are used as the set of orthogonal basis functions. The corresponding polynomial coefficients up to the first 10 Zernike terms were obtained and the resulting reconstructed wavefront presents an RMS reconstruction error compliant to most optical systems of interest.
This work presents the fabrication of a high fill factor Fresnel microlens array (MLA) by employing a low-cost homebuilt
maskless exposure lithographic system. A phase relief structure was generated on a photoresist-coated silicon
wafer, replicated in Polydimethylsiloxane (PDMS) and electrostatically bonded to a glass substrate. Optical
characterization was based on the evaluation of the maximum intensity of each spot generated at the MLA focal plane as
well as its full width at half maximum (FWHM) intensity values. The resulting FWHM and maximum intensity spot
mean values were 50 ± 8% μm and 0.71 ± 7% a.u , respectively. Such a MLA can be applied as Shack-Hartmann
wavefront sensors, in optical interconnects and to enhance the efficiency of detector arrays.
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