We pursue the objective of developing a scatterometer based on focused-beam illumination and back-focal plane
imaging which is suitable for characterization of truly three-dimensional objects and provides locally-resolved
measurements unlike most of the state-of-the-art scatterometry tools. In this paper a full-scale simulation model for the
scatterometry is proposed, comprising vector description for the illumination and imaging in terms of physical optics,
and rigorous calculation of light-object interaction in the near field by a finite-difference-in-time-domain solver. Using
the model we optimize the scatterometry technique to get higher sensitivity to nano-scale dimensional variations of the
profile of test patterns. It has been demonstrated that asymmetry of the scattered field distribution allows one to
determine separately different parameters of test structures, including refractive index, height, width, side wall, and
orientation. Finally, we present a comparison of our approach with the through-focus scanning optical microscopy
method.
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