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Satoru Oishi
at Canon Inc
SPIE Involvement:
Author
Publications (4)
Proceedings Article | 25 March 2008 Paper
Scatterometry based overlay metrology
Proceedings Volume 6922, 69223L (2008) https://doi.org/10.1117/12.768906
KEYWORDS: Overlay metrology, Scatterometry, Optical alignment, Lithography, Inspection, Semiconductors, Silicon, Semiconducting wafers, Distortion, Metrology
Proceedings Article | 4 April 2007 Paper
Focus and dose controls, and their application in lithography
Proceedings Volume 6518, 651807 (2007) https://doi.org/10.1117/12.710456
KEYWORDS: Semiconducting wafers, Control systems, Finite element methods, Semiconductors, Data modeling, Critical dimension metrology, Lithography, Wafer testing, Signal processing, Inverse problems
Proceedings Article | 17 May 2005 Paper
Log data extraction and correlation miner for lithography management system: LMS-LEC
Eiichi Kawamura, Hidetaka Tsuda, Hidehiro Shirai, Satoru Oishi, Hideki Ina
Proceedings Volume 5755, (2005) https://doi.org/10.1117/12.594994
KEYWORDS: Inspection, Lithography, Control systems, Statistical analysis, Mining, Data analysis, Manufacturing, Process control, Data mining, Semiconductors
Proceedings Article | 10 May 2005 Paper
Focus and dose measurement method in volume production
Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.593058
KEYWORDS: Semiconducting wafers, Finite element methods, Data modeling, Semiconductors, Optical testing, Neural networks, Critical dimension metrology, Wafer-level optics, Wafer testing, Lithography
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