Sanjay H. Kapasi
Product Manager at KLA Texas
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 31 March 2014 Paper
Proceedings Volume 9052, 90520D (2014) https://doi.org/10.1117/12.2047115
KEYWORDS: Semiconducting wafers, Data modeling, Optical proximity correction, Calibration, Optical lithography, Wafer-level optics, Scanning electron microscopy, Photomasks, Modulation, Lithography

Proceedings Article | 31 March 2014 Paper
Yang Ping, Sarah McGowan, Ying Gong, Yee Mei Foong, Jian Liu, Jianhong Qiu, Vincent Shu, Bo Yan, Jun Ye, Pengcheng Li, Hui Zhou, Taksh Pandey, Jiao Liang, Chris Aquino, Stanislas Baron, Sanjay Kapasi
Proceedings Volume 9052, 90521N (2014) https://doi.org/10.1117/12.2048513
KEYWORDS: Optical proximity correction, SRAF, Source mask optimization, Resolution enhancement technologies, Molybdenum, Photomasks, Electroluminescence, Astatine, Printing, Neodymium

Proceedings Article | 31 March 2014 Paper
A. Szucs, J. Planchot, V. Farys, E. Yesilada, L. Depre, S. Kapasi, C. Gourgon, M. Besacier, O. Mouraille, F. Driessen
Proceedings Volume 9052, 905208 (2014) https://doi.org/10.1117/12.2047281
KEYWORDS: 3D modeling, Calibration, Data modeling, Photomasks, Lithography, Semiconducting wafers, Scanning electron microscopy, Atomic force microscopy, Process control, Etching

Proceedings Article | 28 March 2014 Paper
Carl Babcock, Dongok Yang, Sarah McGowan, Jun Ye, Bo Yan, Jianhong Qiu, Stanislas Baron, Taksh Pandey, Sanjay Kapasi, Chris Aquino
Proceedings Volume 9053, 90530Z (2014) https://doi.org/10.1117/12.2046662
KEYWORDS: Optical proximity correction, SRAF, Source mask optimization, Optical lithography, Photovoltaics, Neodymium, Lithography, Model-based design, Resolution enhancement technologies

Proceedings Article | 10 March 2010 Paper
Proceedings Volume 7640, 764033 (2010) https://doi.org/10.1117/12.846376
KEYWORDS: Performance modeling, Semiconducting wafers, Optical lithography, Oxides, Lithography, Standards development, Photomasks, Double patterning technology, Computer simulations, Polymers

Proceedings Article | 4 March 2010 Paper
Proceedings Volume 7640, 76401S (2010) https://doi.org/10.1117/12.846010
KEYWORDS: 3D modeling, Photomasks, Data modeling, Calibration, Performance modeling, 3D image processing, Semiconducting wafers, Seaborgium, Instrument modeling, Optical simulations

Proceedings Article | 4 March 2010 Paper
Proceedings Volume 7640, 76401V (2010) https://doi.org/10.1117/12.846562
KEYWORDS: Logic, Semiconducting wafers, Aluminum, Photomasks, Photoresist materials, Optical alignment, Optical lithography, Scanning electron microscopy, Metals, Diffusion

Proceedings Article | 10 December 2009 Paper
Proceedings Volume 7520, 75200B (2009) https://doi.org/10.1117/12.837201
KEYWORDS: Fiber optic illuminators, Electroluminescence, Computational lithography, Artificial intelligence, Calibration, Optical proximity correction, Logic, Lithography, Physics, Source mask optimization

Proceedings Article | 16 March 2009 Paper
Proceedings Volume 7274, 727430 (2009) https://doi.org/10.1117/12.813561
KEYWORDS: Image processing, Photoresist processing, Lithography, Photomasks, Photoresist materials, Projection systems, Artificial intelligence, Calibration, Electroluminescence, Diffusion

Proceedings Article | 13 March 2009 Paper
Proceedings Volume 7275, 72750W (2009) https://doi.org/10.1117/12.813725
KEYWORDS: Electroluminescence, Fiber optic illuminators, Optical proximity correction, Computational lithography, Resolution enhancement technologies, Photoresist processing, Semiconducting wafers, Lithography, Performance modeling, Artificial intelligence

Proceedings Article | 4 December 2008 Paper
Proceedings Volume 7140, 71402G (2008) https://doi.org/10.1117/12.804632
KEYWORDS: Image processing, Photoresist processing, Lithography, Photomasks, Photoresist materials, Projection systems, Artificial intelligence, Calibration, Electroluminescence, Diffusion

Proceedings Article | 4 March 2008 Paper
Proceedings Volume 6925, 69251D (2008) https://doi.org/10.1117/12.772872
KEYWORDS: Resolution enhancement technologies, Binary data, Optical proximity correction, Computational lithography, Fiber optic illuminators, Photoresist processing, Semiconducting wafers, Calibration, Lithography, Electroluminescence

Proceedings Article | 26 March 2007 Paper
Proceedings Volume 6520, 65203V (2007) https://doi.org/10.1117/12.712864
KEYWORDS: Diffraction, Cadmium, Photomasks, Optical lithography, Optical proximity correction, Monochromatic aberrations, Lithography, Lithographic illumination, Image transmission, Fiber optic illuminators

Showing 5 of 13 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top