Block copolymer (BCP) nanopatterning has emerged as a versatile nanoscale fabrication tool for semiconductor devices and other applications to organize periodic nanostructures with a critical dimension of 5−100 nm. The intrinsically low cost and straightforward processing of BCP nanopatterning have been widely recognized for their large-area parallel formation of dense nanoscale features, which clearly contrasts that of sophisticated processing steps of the typical photolithographic process, including EUV lithography. In this presentation, we highlight our recent progress in the field of BCP nanopatterning for semiconductor as well as nonsemiconductor applications, such as nanocatalysts, metamaterials, sensors, PUF, energy devices and membranes.
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