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Dr. Seil Lee
at ASML Korea Co Ltd
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Author
Publications (1)
Proceedings Article | 26 March 2019 Presentation + Paper
OPC model accuracy study using high volume contour based gauges and deep learning on memory device
Young-Seok Kim, SeIl Lee, Zhenyu Hou, Yiqiong Zhao, Meng Liu, Yunan Zheng, Qian Zhao, Daekwon Kang, Lei Wang, Mark Simmons, Mu Feng, Jun Lang, Byoung-Il Choi, Gilbert Kim, Hakyong Sim, Jongcheon Park, Gyun Yoo, JeonKyu Lee, Sung-woo Ko, Jaeseung Choi, Cheolkyun Kim, Chanha Park
Proceedings Volume 10959, 1095913 (2019) https://doi.org/10.1117/12.2515274
KEYWORDS: Calibration, Metrology, Optical proximity correction, Data modeling, Instrument modeling, Scanning electron microscopy, Time metrology, Neural networks, Semiconducting wafers
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