CONFERENCE PROCEEDINGS
Advanced Search
Russell Callahan
SPIE Involvement:
Author
Publications (1)
Proceedings Article | 21 March 2007 Paper
Minimizing poly end cap pull back by application of DFM and advanced etch approaches for 65nm and 45nm technologies
Russell Callahan, Gunter Grasshoff, Stefan Roling, Joseph Shannon, Asuka Nomura, Sarah McGowan, Cyrus Tabery, Karla Romero
Proceedings Volume 6521, 65211Q (2007) https://doi.org/10.1117/12.712161
KEYWORDS: Etching, Chemistry, Fluorine, Chlorine, Lithography, Bromine, Line edge roughness, Manufacturing, Semiconducting wafers, Optical proximity correction
SIGN IN TO:
  • View contact details
UPDATE YOUR PROFILE
Is this your profile? Update it now.
Sign into your SPIE.org account
Don’t have a profile and want one?
Create an account on SPIE.org
Advertisement
Advertisement
Back to Top