A multiview autostereoscopic LCD display with a localized 2D/3D switching function is developed based on the
actively switchable parallax barrier technology. This switchable barrier comprises of an electro-optically switchable
liquid crystal (LC) and a microretarder. Polymer dispersed liquid crystal (PDLC) with switchable clear and diffusing
states and twisted nematic liquid crystal (TNLC) with polarization switching function are used as switching devices. The
microretarder is prepared by self-developed multibeam laser scanning process, which is clean, friendly to the
environment, and easy for scale up and mass production. The influence factors on the image qualities of 3D displays
based on LCD panel technology are analyzed and discussed. Some solutions have proposed to solve the commercial
application issues.
The Deformed-Split-Ring Resonators (DSRRs) require metal nanostructure on high transmission material substrate for optical application. In this article, a simple method of fabricating three- dimensional polymer nanostructure that use an UV-curable polymer as the resist is discussed. Because UV cure imprinting has high resolution which is about 100nm and high transparency, it is ideally suited for photonic and meta-material optical device applications. The fabrication combines several mass production technologies. The first one is photolithography, such as a stepper UV exposure system can make the nano scale pattern in photoresist, the second is to change the photoresist sample to become the nanoimprint mould by precise electroforming, the third is to use UV cure imprinting to transfer the DSRRs pattern on the UV-curable polymer. Finally, it is also the most important process is that to coat metals and metal lift-off that coating Ag to become buffer layer by sputter, then coating Au into the nanostructure and lift off Ag by HNO3. The DSRR structure is implemented in high transmission UV-curable polymer with Au.
This report is focused on the water-repellant properties of TiO2 and its mixed films with adding certain oxides or fluorides. It is well known that TiO2 films and powders can be used as a water splitting coating due to its photocatalytic reaction. With the addition of the second material, the absorption band and the microstructure of TiO2 films are changed, which will influence their photocatalytic properties. Mixed films based on TiO2 with various compositions were deposited on unheated BK7 glass substrates by e-beam gun coevaporation technique with ion bombardments. Some of the films were also deposited at a glass substrate temperature of 300 degree(s)C without ion assistance. The degrees of water repellence of these films before and after UV irradiation were evaluated in terms of the contact angle of the deionized water on the coating surface. The correlation between the composition, UV-light exposure time and the water-repellant properties of the mixed films ere evaluated and discussed.
Indium tin oxide (ITO) thin films were prepared by unipolar and bipolar dc-pulsed magnetron sputtering in a mixture of argon and oxygen onto the unheated glass substrates. The target of ITO with 10 weight percent tin is used. The influences of polar modes, output frequencies, and on times and off times on the optical, electrical and structural properties of ITO films are investigated. The correlations between the deposition parameters and the film properties are discussed. An optimal condition based on the polar mode and frequency of reactive dc-pulsed sputtering for obtaining the high transmittance and low resistivity of ITO films is suggested.
Gradient dichroic mirrors consisting 25 alternating layers of TiO2 and SiO2 were prepared by reactive electron beam deposition at a glass-substrate temperature of 300 degrees C in a home made planetary planar coating system without mask. Samples with the various tilt angles from the rotating axis were hanged on the edge of four specially designed hollow planets. The thickness variation for a single layer SiO2 over a planet of 16 cm diameter at the height of 60 cm was less than 3 percent. This coating system was very suitable for the coating of gradient dichroic mirrors with large area showing the consistent color performance with various incident angles across the mirror surface.
Optical thin film color splitting and combining components for 3 panel projection display were designed using TiO2 and SiO2 as high and low refractive index materials, respectively, and fabricated by reactive electron-beam deposition at a substrate temperature of 300 degrees C. The resulting coating performances on the brightness and color performance were analyzed by chroma meter. The correlations between these results and their spectral curves measured by spectrophotometer were discussed.
The technique of mid-frequency plasma polymerization was employed to deposit scratch-resistant and anti-fogging films on transparent polycarbonate substrates. The input monomer used for depositing scratch-resistant coatings was tetramethyldisiloxane (TMDSO). Variation of oxygen-to-TMDSO ratio study indicated that the hardest film was formed using equal amount of oxygen and TMDSO. The typical deposition rate was about 3 micrometers /hr. Typical operation pressure, TMDSO flow and oxygen flow were 2 X 10-2 Torr, 30 sccm and 30 sccm, respectively. The deposited polysiloxane layer was characterized as a hard, highly transparent and durable against scratching and abrasion film. Further depositing a thin hydrophilic film on top of the polysiloxane layer significantly improved the surface wettability and therefore dramatically increased the anti-fogging capability. The monomer used for polymerization deposition of the anti- fogging film was vinyl acetate, and the typical flow for vinyl acetate monomer and oxygen were 15 sccm and 10 sccm, respectively.
TiO2-SiO2 composite films are sandwiched between indium tin oxide (ITO) layer and soda lime glass as a buffer layer. The TiO2-SiO2 composite and ITO layers are sequentially deposited on glass substrates by ion-assisted electron-beam evaporation in the same coating chamber. Influences of the TiO2-SiO2 composite film with various compositions on the structural, optical, and electrical properties of ITO layer before and after annealing in air at 300 degree(s)C and 500 degree(s)C for 1h are systematically investigated using a x-ray diffractometer, spectrophotometer, and four point probe. Surface roughness of as-deposited and post-annealed samples are measured by talysurface and scanning electron microscopy. Correlations between the electrical properties and the surface roughnesses and structures of ITO coatings are also discussed.
The influence of the deposition rate on the microstructure and hardness of TiO2-SiO2 and TiO2-MgF2 composites and their single component films prepared by reactive ion-assisted coevaporation in the deposition rate range 0.14 to 2 nm/s are investigated using an x-ray diffractometer, a transmission electron microscope, and a microhardness tester. It is found that the hardness of the composite films and their single components increase with a decreasing deposition rate. However, the hardnesses of TiO2-SiO2 and TiO2-MgF2 composite films were generally lower than that of pure SiO2 and MgF2, respectively, at the same component deposition rate. This indicates that the addition of TiO2 reduces the hardness of Si02 and MgF2 films. The ultrahigh hardness of pure MgF2 films deposited by ion assistance at the deposition rate of 0.14 nm/s probably results from the high packing density, low lattice defects, and the small grain size (<20 nm) with the preferred orientation of [110]. Furthermore, the homogeneous dispersion of these hard nanoscale MgF2 grains within the amorphous TiO2 matrix causes the hardening of the composite film.
Ion-assisted deposition (IAD) processes configured with a well-controlled plasma source at the center base of a vacuum chamber, which accommodates two independent e-gun sources, is used to deposition TiO2MgF2 and TiO2-SiO2 composite films of selected component ratios. Films prepared by this technology are found durable, uniform, and nonabsorbing in visible and near-IR regions. Single- and multilayer antireflection coatings with refractive index from 1.38 to 2.36 at (lambda) equals 550 nm are presented. Methods of enhancement in optical performance of these coatings are studied. The advantages of AR coatings formed by TiO2-MgF2 composite films over those similar systems consisting of TiO2-SiO2 composite films in both visible and near-IR regions are also presented.
Hardness of TiO2-MgF2 and TiO2-SiO2 composite films prepared by reactive ion-assisted coevaporation were strongly dependent on the microstructures and evaporation rates of each component. The softening of the composite films at low TiO2 composition is caused by the dispersion of amorphous TiO2 particles in the sort amorphous SiO2 or soft crystalline MgF2 matrix, which is obtained at the high evaporation rate of SiO2 or MgF2. In contrast, the hardening of the composite films at high TiO2 composition is produced by the dispersion of hard amorphous SiO2particles or hard crystalline MgF2 grains with the size <20 nm within the amorphous TiO2matrix, which is obtained at the low evaporation rate of SiO2 or MgF2. In these cased, the evaporation rate of TiO2 is always maintained at 0.2 nm/s.
Composite TiO2-MgF2 films are fabricated by reactive ion-assisted coevaporation. The optical, structural, mechanical, and chemical properties of these films are systematically studied. From the analysis of x-ray diffraction and spectrophotometer data the crystallographic phase compositions and the optical properties of the composite films are found to be controlled by the relative deposition rate of two evaporation sources. The refractive index and the microhardness of the composite films behave nonlinearly with respect to the composition of the films. When the molar fraction of TiO2 is higher than 40%, the hardness of the composite films exceeds that of pure TiO2 and glass substrate. The surface morphologies of all composite films are featureless and very smooth. It has been shown that composite TiO2-MgF2 films prepared by reactive ion-assisted coevaporation are very suitable for the design and fabrication of single-layer and multilayer antireflection coatings.
Optical and physical properties of MgF2, ZnSe, and composite ZnSe-MgF2 films deposited by co-evaporation of ZnSe and MgF2 on glass substrates at elevated temperatures are studied. MgF2 films deposited on glass substrates at temperature of 200 degree(s)C were found durable, resistant to wet environment, high in film packing density, and having a very reproducible refractive index of 1.38 to 0.75 micrometers . ZnSe films formed under same substrate conditions were also found dense and reproducible. The refractive indices of these films were determined to be 2.50 +/- 0.01 at 0.75 micrometers . The adhesion of the films to the substrate declined drastically in hot and wet environment. Composite films deposited on glass substrate at 200 degree(s)C by co-evaporation of ZnSe and MgF2 with selected individual evaporation rates were observed to be uniform, durable, and enhanced in protection against hazardous environments.
The optical and structural properties of TiO2-MgF2 mixed films prepared by coevaporation with ion-assisted deposition have been investigated. The composition of coevaporated TiO2-MgF2 mixed films can be tuned by controlling the relative deposition rates of the two sources. Most of the films with thicknesses less than 500 nm are found to be homogeneous in optical properties. The optical and structural properties of the mixed films change from MgF2-dominant to TiO2-dominant as the TiO2 content in the mixed film increases. The dependence of the refractive index with composition can be fitted by Bottcher's formula at low TiO2 content and by Lorentz-Lorentz formula at high TiO2 content in the mixed films. An application of TiO2-MgF2 mixed films for the design and fabrication of antireflection coatings in the near infrared region has also been discussed.
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