This work improves period uniformity over larger-area gratings in a two-spherical beam interference lithography (IL) setup. Using a concave vacuum chuck, we have experimentally demonstrated the modified optical setup to reduce period variation (chirp) on a 4-inch silicon substrate. The change in the grating period is significantly reduced compared with the interference exposure on a flat silicon substrate. Wavefront aberration measurement on a curved exposed substrate showed improved grating linearity.
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