Mr. Pierre-Yves Guittet Profile

Pierre-Yves Guittet

Sales Support at Nanda-Technologies GmbH

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Publications (3)

Proceedings Article | 2 April 2010 Paper

Full wafer macro-CD imaging for excursion control of fast patterning processes

Lars Markwort, Christoph Kappel, Reza Kharrazian, Pierre-Yves Guittet

Proceedings Volume 7638, 763807 (2010) https://doi.org/10.1117/12.846618

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Optical lithography, Etching, Metrology, Inspection, Neodymium, Image processing, Logic, Process control

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Proceedings Article | 10 May 2005 Paper

Wafer current measurement for process monitoring

Dmitry Shur, Alexander Kadyshevitch, Jeremy Zelenko, Carlos Mata, Victor Verdugo, Pierre-Yves Guittet, Brian Starr, Craig Duncan, Stefano Ventola, Jan Klinger

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.598398

KEYWORDS: Semiconducting wafers, Etching, Critical dimension metrology, Scanning electron microscopy, Photomasks, Process control, Dielectrics, Cadmium sulfide, Silicon, Electrons

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Proceedings Article | 24 May 2004 Paper

Infrared spectroscopic ellipsometry in semiconductor manufacturing

Pierre-Yves Guittet, Ulrich Mantz, Peter Weidner, Jean-Louis Stehle, Marc Bucchia, Sophie Bourtault, Dorian Zahorski

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.533935

KEYWORDS: 3D modeling, Infrared spectroscopy, Semiconducting wafers, Infrared radiation, Silicon, Spectroscopic ellipsometry, Metrology, Mid-IR, Reflection, Scanning electron microscopy

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