A polarization independent band-pass filter is created by combining a silicon cross-slot waveguide and a Bragg grating cavity. By theoretically investigating different types of cavities we show how the sensitivity to polarization of the device can vary, and how we can strongly confine light in a two-dimensional slot waveguide. This kind of structure, where a slot waveguide, a photonic crystal and a nanowire waveguide are merged together, may find applications in the field of sensing. Indeed, a slight variation in the surrounding refractive index breaks the device symmetry. One polarization can thus be used to monitor the fluctuation of the other one. We describe here the principle of a Bragg grating merged with a cross slot waveguide in which a cavity is placed. We discuss the advantage of using different geometries of cavity and how this choice may affect the response of the device.
In this paper we describe an approach to reduce the propagation loss in titanium dioxide strip waveguides. We achieved to reduce losses down to 2.4 dB/cm in 1 μm-wide waveguide at λ=1550 nm.
In this proceeding we are describing the optimization of a silicon slot waveguide coated with titanium dioxide deposited by Atomic Layer Deposition. In addition we show the characterization of a photonic crystal cavity directly patterned on a slot waveguide.
We investigate an affordable, accurate and large-scale production method to fabricate subwavelength grating structures by hot embossing replication in polycarbonate substrates. We use inorganic hydrogen silsesquioxane (HSQ), a high resolution, binary, negative electron beam resist, on silicon substrate to make a stamp for replication. The stamp is fabricated without any etching processes and with simple process steps. The process starts by spin coating an HSQ-resist layer on a silicon substrate. The desired film thickness is achieved by adjusting the spinning speed and time. The resist material is then subjected to e-beam writing and development followed by a heat treatment to enhance the hardness and to obtain hot embossing stamp material properties comparable with solid SiO2. A comparison with and without the silicon etching is also performed. We demonstrate that a high quality stamp for thermal nano-imprint lithography for optical gratings can be fabricated using an inexpensive process without an etching step. The process results in a uniform imprinting density over the entire grating surface and high imprint fidelity. The reflectance spectra of replicated grating structures are also shown to be in agreement with theoretical calculations.
We investigated an affordable, accurate and large scale production method to fabricate sub-wavelength grating structures
by replication in polycarbonate substrates by hot embossing. We used hydrogen silsesquioxane (HSQ) a high resolution,
binary, inorganic, negative electron beam resist, on silicon substrate to make a stamp for replication. We fabricated the
stamp on silicon by using HSQ-resist without any etching process with simple process steps. The process starts by
depositing an HSQ-resist layer on a silicon substrate and by a measurement of the desired film thickness by adjusting the
spinning speed and time. The resist material is then subjected to e-beam writing followed by a heat treatment to enhance
the hardness and to reveal properties analogous to solid SiO2 as a hot embossing stamp material. A comparison study is
made with and without the etching process with different etching rates. We demonstrate that an effective and inexpensive
stamp for thermal nano-imprint lithography (NIL) for optical gratings is provided without an etching process, which
gives a uniform imprinting density over the entire grating surface and high imprint fidelity. The reflectance spectra of
replicated grating structures are also shown to be in agreement with theoretical calculations.
We investigate the design of binary grating structures, e.g. resonance waveguide filters (RWFs), with
subwavelength feature sizes, taking the temperature dependence of different material parameters into account. Our final
goal is to demonstrate devices with athermal operation. We design the binary grating structures to be made in polymer
substrates, such as polycarbonate (PC), due to their potential for low cost, mass fabrication. The high thermal expansion
coefficient (TEC) of polymers, compared to inorganic optical materials, enhances the thermal sensitivity of the grating
structures. The gratings are designed using Fourier Model Method (FMM) by considering both thermal expansion and
thermo-optic effects on the resonance wavelength shift. The fabrication of RWF structures is proposed by e-beam
lithography, creating a master stamp and copying the structures into a polymer substrate by some replication techniques,
followed by an ALD deposition of TiO2. When the resonance waveguide grating RWG is designed for nearly room
temperature operation at a peak wavelength of 633 nm with a full width half maximum FWHM of 3 nm (TM mode
reflectance), the peak wavelength shifts 0.2 nm /50C when only the TEC is taken into account. However, taking into
account also the thermo-optic coefficients TOCs of PC and TiO2, the peak position shifts to 0.4 nm/ 50C on the opposite
side of spectral central wavelength. Thus the overall shift reduces to 0.2 nm /5 0C, illustrating partial athermalization. It
was also observed that thermo-optic coefficient TOC contributed more significantly than TEC effect. The wavelengths
shift was almost linear with respect to temperature for both effects and showed slopes of 0.0673, 0.0422 and 0.02352 for
TOC, TEC and combined effects, respectively.
This paper reviews the development of hydrogen silsesquioxane nanostructures (sub-100nm) on a silicon platform.
The effect of HSQ resist in thick (128nm thick resist) and thinner state (30nm thick resist) has been demonstrated and
minimum possible structures with these are discussed in details. Most applicable structures like straight lines/spaces,
sharp joints/corners and dots were developed to investigate the effects of development time on the lithography
properties of HSQ. Soft bake after spinning process had been avoided in view of achieving better contrast and stable
resist deposition. We had also reached to a conclusion that increasing the development time could improve resist
contrast and pattern resolutions up to certain limits but may vary with type of structures and other conditions.
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