Mr. Oliver H. Rudolph Profile

Oliver H. Rudolph

Engineering of Test Procedures for Products at Robert Bosch GmbH

SPIE Involvement:

Author

Area of Expertise:

Simulation

Websites:

Company Website

Publications (2)

SPIE Journal Paper | 23 February 2012

Rigorous electromagnetic field simulation of the impact of photomask line-edge and line-width roughness on lithographic processes

Oliver Rudolph, Peter Evanschitzky, Andreas Erdmann, Eberhard Bär, Jürgen Lorenz

JM3, Vol. 11, Issue 1, 013004, (February 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.1.013004

KEYWORDS: Photomasks, Line width roughness, Spatial frequencies, Electromagnetism, Critical dimension metrology, Near field, Line edge roughness, Waveguides, Lithography, Artificial intelligence

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Proceedings Article | 14 October 2011 Paper

Rigorous EMF simulation of the impact of photomask line-edge and line-width roughness on lithographic processes

Oliver Rudolph, Peter Evanschitzky, Andreas Erdmann, Eberhard Bär, Jürgen Lorenz

Proceedings Volume 8166, 81663Z (2011) https://doi.org/10.1117/12.898522

KEYWORDS: Line width roughness, Spatial frequencies, Photomasks, Line edge roughness, Critical dimension metrology, Near field, Waveguides, Artificial intelligence, Lithography, Image analysis

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