Dr. Nitesh Pandey Profile

Dr. Nitesh Pandey

at ASML

SPIE Involvement:

Author

Publications (11)

Proceedings Article | 26 August 2024 Paper

High NA EUV stitching: mask performance is a key

Natalia Davydova, Vincent Wiaux, Nick Pellens, Tatiana Kovalevich, Laura Huddleston, Frank Timmermans, Cyrus Tabery, Joost Bekaert, Lieve van Look, Alberto Colina, Bram Slachter, Nitesh Pandey, Stefan Hunsche, Ataklti Weldeslassie, Guillaume Libeert

Proceedings Volume 13177, 131770F (2024) https://doi.org/10.1117/12.3034393

KEYWORDS: Reflectivity, Optical proximity correction, Critical dimension metrology, Reflection, Light sources and illumination, Semiconducting wafers, Tantalum, Design, 3D mask effects, Scanners

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Proceedings Article | 12 December 2023 Poster + Paper

Aerial imaging (AIMS) based computational lithography model calibration and mask metrology for high-NA EUV

Nitesh Pandey, Stefan Hunsche, Adam Lyons, Christoph Hennerkes, Andreas Verch, Maximilian Albert, Grizelda Kersteen, Renzo Capelli, Werner Gillijns, Balakumar Baskaran, Joost Bekaert

Proceedings Volume PC12751, PC127510Z (2023) https://doi.org/10.1117/12.2688109

KEYWORDS: Calibration, Metrology, Scanning electron microscopy, Data modeling, Extreme ultraviolet, Critical dimension metrology, Semiconducting wafers, Computational lithography, Design, Optical proximity correction

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Proceedings Article | 1 December 2022 Poster + Paper

Aerial image metrology (AIMS) based mask-model accuracy improvement for computational lithography

N. Pandey, S. Hunsche, A. Lyons, J. Chen, R. la Greca, R. Capelli, G. Kersteen

Proceedings Volume 12293, 122930R (2022) https://doi.org/10.1117/12.2641724

KEYWORDS: Photomasks, Calibration, 3D modeling, Data modeling, Metrology, Optical proximity correction, SRAF, Semiconducting wafers, Reticles, Critical dimension metrology

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Proceedings Article | 26 May 2022 Presentation + Paper

Fast and robust overlay metrology from visible to infrared wavelengths using dark-field digital holographic microscopy

C. Messinis, T. T. van Schaijk, N. Pandey, V. Tenner, A. Koolen, S. Witte, J. de Boer, A. den Boef

Proceedings Volume 12053, 120530B (2022) https://doi.org/10.1117/12.2604201

KEYWORDS: Overlay metrology, Digital holography, Diffraction, Sensors, Infrared radiation, Diffraction gratings, Holography, Visible radiation, Cameras, Image sensors

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SPIE Journal Paper | 14 February 2022

Diffraction-based overlay metrology from visible to infrared wavelengths using a single sensor

Theodorus T. van Schaijk, Christos Messinis, Nitesh Pandey, Armand Koolen, Stefan Witte, Johannes de Boer, Arie Den Boef

JM3, Vol. 21, Issue 01, 014001, (February 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.1.014001

KEYWORDS: Overlay metrology, Sensors, Infrared radiation, Visible radiation, Cameras, Holograms, Digital holography, Infrared sensors, Semiconducting wafers, Infrared imaging

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Proceedings Article | 20 June 2021 Presentation + Paper

Fast and robust diffraction based overlay metrology using dark-field digital holographic microscopy

T. T. M. van Schaijk, C. Messinis, N. Pandey, V. T. Tenner, A. Koolen, S. Witte, J. F. de Boer, A. J. den Boef

Proceedings Volume 11782, 117820O (2021) https://doi.org/10.1117/12.2591989

KEYWORDS: Overlay metrology, Digital holography, Diffraction, Microscopy, Holography, Diffraction gratings, Metrology, Process control, Optical lithography, Inspection

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Proceedings Article | 15 October 2012 Paper

A Resistive Type Humidity Sensor Based on ZnO-SnO2 Nanocomposite

Karunesh Tiwari, N. K. Pandey, Alok Kumar

Proceedings Volume 8549, 854916 (2012) https://doi.org/10.1117/12.924796

KEYWORDS: Humidity, Resistance, Chemical elements, Zinc oxide, Sensors, Nanocomposites, Scanning electron microscopy, Photomicroscopy, Annealing, Copper

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Proceedings Article | 27 May 2011 Paper

Compensation of reference beam sphericity in a multi-perspective digital holography based record-display setup

Nitesh Pandey, Bryan Hennelly

Proceedings Volume 8082, 80822D (2011) https://doi.org/10.1117/12.889350

KEYWORDS: Digital holography, Holograms, 3D image reconstruction, Digital recording, Spatial light modulators, Cameras, 3D displays, Holography, 3D metrology, Interferometers

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Proceedings Article | 11 May 2011 Paper

Memory efficient noise reduction in in-line Fresnel digital holography

Nitesh Pandey, Bryan Hennelly

Proceedings Volume 8074, 807404 (2011) https://doi.org/10.1117/12.886936

KEYWORDS: Holograms, Digital holography, 3D image reconstruction, Quantization, Speckle, Holography, Denoising, Digital imaging, Cameras, Image quality

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SPIE Journal Paper | 1 September 2009

Resolution limits in practical digital holographic systems

Damien Kelly, Bryan Hennelly, Nitesh Pandey, Thomas Naughton, William Rhodes

OE, Vol. 48, Issue 09, 095801, (September 2009) https://doi.org/10.1117/12.10.1117/1.3212678

KEYWORDS: Cameras, Digital holography, Imaging systems, Spatial frequencies, Holograms, Holography, Optical engineering, 3D image reconstruction, Image resolution, Systems modeling

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Proceedings Article | 27 August 2009 Paper

Speed up of Fresnel transforms for digital holography using pre-computed chirp and GPU processing

Nitesh Pandey, Damien Kelly, Thomas Naughton, Bryan Hennelly

Proceedings Volume 7442, 744205 (2009) https://doi.org/10.1117/12.830587

KEYWORDS: Digital holography, Holograms, Quantization, 3D image reconstruction, Reconstruction algorithms, Transform theory, Matrices, Cameras, Graphics processing units, Holography

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Showing 5 of 11 publications

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