Prof. Nien-Po Chen Profile

Prof. Nien-Po Chen

Assistant professor at Yuan Ze Univ

SPIE Involvement:

Author

Publications (5)

SPIE Journal Paper | 1 January 2010

Analysis of the focal pattern distortion of a cylindrical concave micro-grating in a slab waveguide and the mechanism of spatial resolution recovery

Cheng Ko, Jian-Shian Lin, Nien-Po Chen, Chang-Tai Chen, Ji-Lin Shen

OE, Vol. 49, Issue 01, 018001, (January 2010) https://doi.org/10.1117/12.10.1117/1.3290241

KEYWORDS: Waveguides, Sensors, Image sensors, Distortion, Spectroscopy, Spectral resolution, Diffraction, Diffraction gratings, Video, Optical engineering

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Proceedings Article | 27 August 2009 Paper

The design of the multiple resonance microcavity by reflection phase manipulation of non-QWS DBR for OLED chromaticity enhancement

Nien-Po Chen, Meng-Hsian Chou, Chao-Chen Wang, Cheng-Jung Hsieh, Yu-Cheng Chan, Shu-Jin Kuo

Proceedings Volume 7415, 74151K (2009) https://doi.org/10.1117/12.825550

KEYWORDS: Optical microcavities, Organic light emitting diodes, Mirrors, Dielectrics, Quantum wells, Reflectivity, Dielectric mirrors, Metals, Organic materials, Distributed Bragg reflectors

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Proceedings Article | 18 August 2009 Paper

The influence of Si doping to the characteristics of AlGaAs / AlAs distributed Bragg reflectors

Chin-Hua Tu, Nien-Po Chen, Jin-Hsiang Liu

Proceedings Volume 7422, 742216 (2009) https://doi.org/10.1117/12.825596

KEYWORDS: Aluminium gallium indium phosphide, Reflectivity, Annealing, Light emitting diodes, Silicon, Optical properties, Crystals, Doping, Distributed Bragg reflectors, Tellurium

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Proceedings Article | 4 December 2008 Paper

Application of exposure simulation system to reduce isolated-dense bias by using annular off-axis illumination

Yi-Nan Shih, Nien-Po Chen

Proceedings Volume 7140, 714033 (2008) https://doi.org/10.1117/12.804649

KEYWORDS: Photomasks, Semiconducting wafers, Optical proximity correction, Deep ultraviolet, Optical lithography, Computer simulations, Phase shifts, Mask making, Optical scanning systems, Critical dimension metrology

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Proceedings Article | 15 May 2007 Paper

Application of exposure simulation system to CD control investigation at 130-nm photolithography node

Yu-Kuang Huang, Nien-Po Chen, Jason Chou, Judith Chang

Proceedings Volume 6607, 66072B (2007) https://doi.org/10.1117/12.728994

KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Scanning electron microscopy, Control systems, Etching, Optical testing, Process control, Deep ultraviolet, Diffusion

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