Muhammad Safdar
at imec
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 1 December 2022 Poster + Paper
Proceedings Volume 12292, 122920V (2022) https://doi.org/10.1117/12.2645864
KEYWORDS: Extreme ultraviolet lithography, Photoresist materials, Extreme ultraviolet, Lithography, Photoresist developing

SPIE Journal Paper | 15 November 2022
JM3, Vol. 21, Issue 04, 044601, (November 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.4.044601
KEYWORDS: Extreme ultraviolet lithography, Photoresist materials, Surface roughness, Line width roughness, Semiconducting wafers, Optical lithography, Extreme ultraviolet, Lithography, Coating, Thin films

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