Mr. Mike Kubenz Profile

Mike Kubenz

at micro resist technology GmbH

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 22 March 2007 Paper

Nanoimprinting with SU-8 epoxy resists

Donald Johnson, Harris Miller, Mike Kubenz, Freimut Reuther, Gabi Gruetzner

Proceedings Volume 6517, 65172A (2007) https://doi.org/10.1117/12.713710

KEYWORDS: Nanoimprint lithography, Semiconducting wafers, Epoxies, Polymers, Ultraviolet radiation, Temperature metrology, Coating, Etching, Lithography, Resistance

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Proceedings Article | 15 March 2007 Paper

mr-NIL 6000: new epoxy-based curing resist for efficient processing in combined thermal and UV nanoimprint lithography

Christine Schuster, Mike Kubenz, Freimut Reuther, Marion Fink, Gabi Gruetzner

Proceedings Volume 6517, 65172B (2007) https://doi.org/10.1117/12.713094

KEYWORDS: Annealing, Polymerization, Ultraviolet radiation, Nanoimprint lithography, Photoresist processing, Temperature metrology, Lithography, Epoxies, Polymers, Glasses

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Proceedings Article | 6 May 2005 Paper

Development of thermosets for thermal nanoimprint lithography at decreased temperatures

Freimut Reuther, Mike Kubenz, Christine Schuster, Marion Fink, Marko Vogler, Gabi Gruetzner, Juergen Grimm, Andi Kaeppel

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600851

KEYWORDS: Polymers, Nanoimprint lithography, Photoresist processing, Annealing, Polymerization, Glasses, Semiconducting wafers, Polymethylmethacrylate, Solids, Distortion

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Proceedings Article | 12 June 2003 Paper

Challenges of processing thick and ultrathick photoresist films

Mike Kubenz, Ute Ostrzinski, Freimut Reuther, Gabi Gruetzner

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485084

KEYWORDS: Photoresist materials, Coating, Optical lithography, Lithography, Infrared radiation, Photoresist processing, Semiconducting wafers, Ultraviolet radiation, Photomasks, Silicon

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