Mr. Michael S. Twiford Profile

Michael S. Twiford

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Publications (2)

Proceedings Article | 4 September 1998 Paper

Merged 2.5-V and 3.3-V 0.25-um CMOS technology

Isik Kizilyalli, Robert Huang, D. Hwang, Brittin Kane, R. Ashton, S. Kuehne, X. Deng, Michael Twiford, E. Martin, D. Shuttleworth, K. Wittingham, S. Lytle, Yi Ma, Pradip Roy, Leonard Olmer, Hem Vaidya, F. Li, X. Li, Eric Persson, A. Massengale, L. Stirling, D. Chesire, K. Steiner, Rafael Barba, Morgan Thoma, William Cochran

Proceedings Volume 3506, (1998) https://doi.org/10.1117/12.323964

KEYWORDS: Transistors, Oxides, CMOS technology, Dielectrics, Picosecond phenomena, Metals, Oscillators, Deposition processes, Silicon, Arsenic

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Proceedings Article | 12 September 1996 Paper

High contact resistance heavily doped silicided p+ junctions

Michael Twiford, F. Stevie, E. Prather, Morgan Thoma, William Cochran

Proceedings Volume 2874, (1996) https://doi.org/10.1117/12.250851

KEYWORDS: Resistance, Titanium, Silicon, Boron, Metals, Interfaces, CMOS technology, Semiconducting wafers, Field effect transistors, Very large scale integration

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