Mr. Mark W. Perpall Profile

Mark W. Perpall

at Clemson Univ

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Proceedings Article | 15 January 2003 Paper

Processable high-carbon-yielding polymer for micro- and nanofabrication

Mark Perpall, Huseyin Zengin, K. Prasanna Perera, Wensheng Zhou, Hiren Shah, Xinyu Wu, Stephen Creager, Dennis Smith, Stephen Foulger, John Ballato

Proceedings Volume 4979, (2003) https://doi.org/10.1117/12.478252

KEYWORDS: Carbon, Polymers, Optical fibers, Silica, Polymerization, Scanning electron microscopy, Capillaries, Refractive index, Silicon, Electrodes

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Bis-ortho-Diynyl Arene (BODA) monomers polymerize to network polynapthalene by the thermally-driven Bergman cyclization and subsequent radical polymerization via oligomeric intermediates that can be melt or solution processed. Further heating of the network to 1000 °C affords a high-yield glassy carbon structure that retains the approximate size and dimensions of the polymer precursor. The higher carbon-yield for BODA networks (75- 80 % by mass) is significantly greater than that of traditional phenol-formaldehyde resins and other carbon precursor polymers leading to its greater dimensional stability. Phenyl terminated BODA derived polymers were fabricated using microprocessing such as the micromolding in capillaries (MIMIC) technique, direct microtransfer molding, and molding in quartz capillary tubes. Nano-scale fabrication using closed packed silica spheres as templates was demonstrated with an hydroxy-terminated monomer which exhibits greatly enhanced compatibility for silica surfaces. After pyrolysis to glassy carbon, the silica is chemically etched leaving an inverse carbon opal photonic crystal which is electrically conductive. The wavelength of light diffracted is a function of the average refractive index of the carbon/ filler composite, which can be modified for use as sensitive detector elements.

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