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Mark Guglielmana
Senior Engineer at Intel Corp
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Publications (1)
Proceedings Article | 5 April 2007 Paper
Real time monitoring of reticle etch process tool to investigate and predict critical dimension performance
Proceedings Volume 6518, 65181V (2007) https://doi.org/10.1117/12.712323
KEYWORDS: Data modeling, Performance modeling, Process modeling, Reticles, Etching, Sensors, Metrology, Critical dimension metrology, Manufacturing, Data processing
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