Mr. Mans Bjuggren Profile

Mans Bjuggren

Manager of Lithography at Mycronic AB

SPIE Involvement:

Author

Publications (11)

Proceedings Article | 28 June 2005 Paper

High performance FEP-171 resist process in combination with NTAR7 and NTAR5 chrome and the Sigma7300 DUV mask writer

Kezhao Xing, Johan Karlsson, Adisa Paulson, Charles Bjornberg, Axel Lundvall, Peter Hogfeldt, Jukka Vedenpaa, Robin Goodoree, Mans Bjuggren

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617056

KEYWORDS: Photomasks, Diffractive optical elements, Lithography, Binary data, Deep ultraviolet, Etching, Critical dimension metrology, Standards development, Vestigial sideband modulation, Photoresist processing

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Proceedings Article | 20 August 2004 Paper

Pattern accuracy and throughput optimization for an SLM-based 248-nm DUV laser mask pattern generator

Henrik Sjoberg, Jean-Michel Chauvet, Jan Harkesjo, Peter Hogfeldt, Andrzej Karawajczyk, Johan Karlsson, Lars Kjellberg, Jonas Mahlen, Angela Beyerl, Jukka Vedenpaa, Robin Goodoree, Mans Bjuggren, Johan Aman

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557805

KEYWORDS: Photomasks, Spatial light modulators, Manufacturing, Deep ultraviolet, Printing, Raster graphics, Laser applications, Lithography, Image processing, Solids

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Proceedings Article | 17 December 2003 Paper

Resist process optimization for a DUV laser pattern generator

Hans Fosshaug, Adisa Bajramovic, Johan Karlsson, Kezhao Xing, Anna Rosendahl, Anna Dahlberg, Charles Bjoernberg, Mans Bjuggren, Torbjorn Sandstrom

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518058

KEYWORDS: Etching, Photoresist processing, Deep ultraviolet, Chromium, Image processing, Scanning electron microscopy, Dry etching, Chemically amplified resists, Laser applications, Photomasks

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Proceedings Article | 28 August 2003 Paper

Transparent corner enhancement scheme for a DUV pattern generator

Hans Martinsson, Jonas Hellgren, Niklas Eriksson, Mans Bjuggren, Tor Sandstrom

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504276

KEYWORDS: Photomasks, Spatial light modulators, Deep ultraviolet, Mirrors, Image enhancement, Manufacturing, Optical simulations, Solids, Optical proximity correction, Raster graphics

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Proceedings Article | 22 January 2001 Paper

Integration of the Micronic Omega6500 into the mask manufacturing environment

Peter Buck, Mans Bjuggren, Hartmut Buenning, Vishal Garg, Johan Larsson, Tomas Vikholm

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410726

KEYWORDS: Photomasks, Lithography, Manufacturing, Photoresist processing, Laser systems engineering, Etching, Printing, Metrology, Optical proximity correction, Diffractive optical elements

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Proceedings Article | 19 July 2000 Paper

Results from a new laser pattern generator for 180-nm photomasks

Tomas Vikholm, Lars Kjellberg, Per Askebjer, Steven Haddleton, Johan Larsson, Mans Bjuggren

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392080

KEYWORDS: Photomasks, Acousto-optics, Laser systems engineering, Control systems, Modulation, Optical proximity correction, Dry etching, Critical dimension metrology, Calibration, Image registration

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Proceedings Article | 5 July 2000 Paper

Scalable pattern generator data path: for the future

Charlotta Johansson, Lars Ivansen, Anders Thuren, Per Liden, Mans Bjuggren

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389055

KEYWORDS: Data modeling, Photomasks, Data processing, Transistors, Optical proximity correction, Computer simulations, Semiconducting wafers, Electronics, Metals, Semiconductors

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Proceedings Article | 30 December 1999 Paper

CD performance of a new high-resolution laser pattern generator

Per Liden, Tomas Vikholm, Lars Kjellberg, Mans Bjuggren, Klas Edgren, John-Oscar Larson, Steven Haddleton, Per Askebjer

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373335

KEYWORDS: Photomasks, Calibration, Critical dimension metrology, Bragg cells, Signal detection, Lithography, Acousto-optics, Image quality, Control systems, Modulation

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SPIE Journal Paper | 1 March 1997

Characterization of engineering surfaces by infrared scattering

Mans Bjuggren, Laurent Krummenacher, Lars Mattsson

OE, Vol. 36, Issue 03, (March 1997) https://doi.org/10.1117/12.10.1117/1.601253

KEYWORDS: Scattering, Scatter measurement, Infrared radiation, Bidirectional reflectance transmission function, Light scattering, Spatial frequencies, Surface roughness, Receivers, Rayleigh scattering, Surface finishing

Proceedings Article | 8 September 1995 Paper

Quality assessment of engineering surfaces by infrared scattering

Mans Bjuggren, Laurent Krummenacher, Lars Mattsson

Proceedings Volume 2536, (1995) https://doi.org/10.1117/12.218439

KEYWORDS: Scattering, Scatter measurement, Surface finishing, Spatial frequencies, Infrared radiation, Light scattering, Surface roughness, Rayleigh scattering, Receivers, Glasses

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Proceedings Article | 1 December 1993 Paper

Scattering signatures of isolated surface features

Carina Kylner, Joakim Ingers, Lars Mattsson, Mans Bjuggren

Proceedings Volume 1995, (1993) https://doi.org/10.1117/12.162657

KEYWORDS: Scattering, Light scattering, Aluminum, Defect detection, Metals, Mirrors, Integrated circuits, Electromagnetic scattering, Polarization, Software

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Showing 5 of 11 publications

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