Prof. Makoto Hanabata Profile

Prof. Makoto Hanabata

Retired at Osaka Metropolitan Univ

SPIE Involvement:

Author

Publications (29)

Proceedings Article | 23 March 2020 Paper

Study of lithographic characteristics due to differences in novolac resin structure

Atsushi Sekiguchi, Hatsuyuki Tanaka, Hiroko Minami, Yoko Matsumoto, Makoto Hanabata

Proceedings Volume 11326, 113261S (2020) https://doi.org/10.1117/12.2550317

KEYWORDS: Picture Archiving and Communication System, Molecules, Scanning electron microscopy, Photoresist developing, Hydrogen, Molecular interactions

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Proceedings Article | 26 March 2019 Paper

Gas permeable mold for defect reduction in nanoimprint lithography

Kento Mizui, Makoto Hanabata, Satoshi Takei

Proceedings Volume 10958, 1095818 (2019) https://doi.org/10.1117/12.2514790

KEYWORDS: Ultraviolet radiation, Nanoimprint lithography, Quartz, Liquids, Applied physics, Coating, Industrial chemicals, Glasses, Silicon, Semiconducting wafers

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Proceedings Article | 9 October 2018 Paper

Utilization of gas permeable metal plate for the purpose of reduction of transfer defect in MEMS electronic device

Takao Kameda, Naoto Sugino, Satoshi Takei, Makoto Hanabata

Proceedings Volume 10787, 107870Y (2018) https://doi.org/10.1117/12.2325321

KEYWORDS: Metals, Microelectromechanical systems, Confocal microscopy, Microscopes, Glasses, Electronic components, Ultraviolet radiation, Nanoimprint lithography, 3D printing, Lithography

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Proceedings Article | 9 October 2018 Paper

Internal structure of metal material with gas permeability function related to MEMS devices

Naoto Sugino, Takao Kameda, Satoshi Takei, Makoto Hanabata

Proceedings Volume 10787, 107870X (2018) https://doi.org/10.1117/12.2325315

KEYWORDS: Metals, Microelectromechanical systems, 3D printing, X-rays, Computed tomography, Nanoimprint lithography, Printing, Laser cutting, X-ray imaging, Digital cameras

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Proceedings Article | 19 March 2018 Paper

Gas permeable template derived from cellulose in ultraviolet nanoimprint

Shinya Nakajima, Kento Mizui, Makoto Hanabata, Satoshi Takei

Proceedings Volume 10584, 1058416 (2018) https://doi.org/10.1117/12.2297093

KEYWORDS: Ultraviolet radiation, Nanoimprint lithography, Transmittance, Manufacturing

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Proceedings Article | 19 March 2018 Paper

Nanoimprint lithography using gas permeable template II

Makoto Hanabata, Satoshi Takei, Shinya Nakajima, Naoto Sugino, Yoko Matsumoto, Atsushi Sekiguchi

Proceedings Volume 10584, 1058415 (2018) https://doi.org/10.1117/12.2295147

KEYWORDS: Ultraviolet radiation, Nanoimprint lithography, Silicon, Optical lithography, Oxygen, Quartz, Nanofibers, Scanning electron microscopy, Lithography, Industrial chemicals

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Proceedings Article | 31 August 2017 Paper

High resolution patterning of ultraviolet cross-linked resins using gas permeable mold derived from cellulose in nanoimprint lithography

Shinya Nakajima, Satoshi Takei, Makoto Hanabata, Naoto Sugino, Takao Kameda, Yoko Matsumoto, Atsushi Sekiguchi

Proceedings Volume 10354, 103541B (2017) https://doi.org/10.1117/12.2273270

KEYWORDS: Nanoimprint lithography

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Proceedings Article | 31 August 2017 Paper

Organic-inorganic hybrid resist materials in advanced lithography

Satoshi Takei, Naoto Sugino, Makoto Hanabata

Proceedings Volume 10354, 103541Q (2017) https://doi.org/10.1117/12.2275105

KEYWORDS: Nanoimprint lithography, Ultraviolet radiation, Nanostructures, Lithography, Natural surfaces, Photoresist processing, Contamination, Nanoelectronics

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Proceedings Article | 31 August 2017 Paper

Temperature dependence of viscoelasticity of crystalline cellulose with different molecular weights added to silicone elastomer

Naoto Sugino, Shinya Nakajima, Takao Kameda, Satoshi Takei, Makoto Hanabata

Proceedings Volume 10354, 103541F (2017) https://doi.org/10.1117/12.2273503

KEYWORDS: Crystals, Silicon, Composites, Metals, Crystallography

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Proceedings Article | 31 August 2017 Paper

Temperature dependency of mechanical properties for crystalline cellulose added to silicone elastomer

Takao Kameda, Naoto Sugino, Satoshi Takei, Makoto Hanabata

Proceedings Volume 10354, 103541E (2017) https://doi.org/10.1117/12.2273464

KEYWORDS: Silicon, Crystals, Composites, Electronic components, Nanofibers, Solar cells, Antennas, Temperature metrology, Crystallography

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Proceedings Article | 27 March 2017 Paper

Chemically amplified i-line positive resist for next-generation flat panel display

Hsing-Chieh Lee, Ying-Hao Lu, Shin-Yih Huang, Wei-Jen Lan, Makoto Hanabata

Proceedings Volume 10146, 101461G (2017) https://doi.org/10.1117/12.2255875

KEYWORDS: Photoresist materials, Flat panel displays, Array processing, LCDs, Resolution enhancement technologies, Photoresist processing, Silicon, Semiconducting wafers, Wet etching, Coating, Glasses, Molecules

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Proceedings Article | 27 March 2017 Paper

Nanoimprint lithography using gas permeable template

Makoto Hanabata, Satoshi Takei, Shinya Nakajima, Naoto Sugino, Yoko Matsumoto, Atsushi Sekiguchi

Proceedings Volume 10146, 101461I (2017) https://doi.org/10.1117/12.2257095

KEYWORDS: Nanoimprint lithography, Quartz, Nanostructures, Ultraviolet radiation, Polymers, Optical lithography, Nanofibers, Adsorption, Silicon, Oxygen, Lithography, Liquids, Scanning electron microscopy, Line edge roughness

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Proceedings Article | 27 March 2017 Paper

Effects of phenolic compound addition to fractionated Novolak-based resists to improve resolution capability(2)

Atsushi Sekiguchi, Yoko Matsumoto, Yoshihisa Sensu, Satoshi Takei, Makoto Hanabata, Hatsuyuki Tanaka

Proceedings Volume 10146, 101461K (2017) https://doi.org/10.1117/12.2257548

KEYWORDS: Lithography, Flat panel displays, Microelectromechanical systems, Picture Archiving and Communication System, Electroluminescence, Optical lithography, Polymers, Manufacturing, Photoresist processing, Solids

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Proceedings Article | 5 October 2016 Paper

Approach of UV nanoimprint lithography using template with gas-permeable and gaseous adsorption for reduction of air-trapping issue

Satoshi Takei, Naoto Sugino, Takao Kameda, Shinya Nakajima, Makoto Hanabata

Proceedings Volume 9985, 99852C (2016) https://doi.org/10.1117/12.2243401

KEYWORDS: Nanoimprint lithography, Ultraviolet radiation, Photomasks, Adsorption, Optical lithography, Materials processing, Ultraviolet radiation, Optical lithography, Glucose, Oxygen, Resistance, Scanning probe microscopy

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Proceedings Article | 4 October 2016 Paper

Evaluation of the properties of the permeability film material using cellulose nanofibers

Naoto Sugino, Shinya Nakajima, Takao Kameda, Satoshi Takei, Makoto Hanabata

Proceedings Volume 9985, 99851I (2016) https://doi.org/10.1117/12.2243418

KEYWORDS: Nanofibers, Nanoimprint lithography, Transmittance, Lithography, Ultraviolet radiation, Nanotechnology, Transparency, Silicon, Optical lithography, Polymers

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Proceedings Article | 1 April 2016 Paper

Nanoimprint lithography using disposable biomass template

Makoto Hanabata, Satoshi Takei, Kigen Sugahara, Shinya Nakajima, Naoto Sugino, Takao Kameda, Jiro Fukushima, Yoko Matsumoto, Atsushi Sekiguchi

Proceedings Volume 9777, 97771G (2016) https://doi.org/10.1117/12.2217483

KEYWORDS: Nanoimprint lithography, Nanostructures, Ultraviolet radiation, Quartz, Polymers, Nanofibers, Nanotechnology, Lithography, Silicon, Scanning electron microscopy, Polymerization, Resistance, Oxygen, Materials processing

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Proceedings Article | 25 March 2016 Paper

Enhancing the Novolak resin resist resolution by adding phenol to fractionated resin

Atsushi Sekiguchi, Yoko Matsumoto, Hatsuyuki Tanaka, Toshiyuki Horiuchi, Yoshihisa Sensu, Satoshi Takei, Makoto Hanabata

Proceedings Volume 9779, 97791L (2016) https://doi.org/10.1117/12.2218948

KEYWORDS: Picture Archiving and Communication System, Lithography, Astatine, Optical lithography, Flat panel displays, Microelectromechanical systems, Electroluminescence, Solids, Manufacturing, Photoresist processing

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Proceedings Article | 21 March 2016 Paper

EB and EUV lithography using inedible cellulose-based biomass resist material

Satoshi Takei, Makoto Hanabata, Akihiro Oshima, Miki Kashiwakura, Takahiro Kozawa, Seiichi Tagawa

Proceedings Volume 9779, 977929 (2016) https://doi.org/10.1117/12.2217481

KEYWORDS: Lithography, Extreme ultraviolet lithography, Photoresist processing, Electron beam lithography, Electron beams, Extreme ultraviolet, Etching, Silicon, Polymers, Chemical species, Oxygen

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Proceedings Article | 20 March 2015 Paper

Nanoimprint lithography for green water-repellent film derived from biomass with high-light transparency

Satoshi Takei, Makoto Hanabata

Proceedings Volume 9425, 94251V (2015) https://doi.org/10.1117/12.2081820

KEYWORDS: Ultraviolet radiation, Nanoimprint lithography, Transparency, Antireflective coatings, Nanostructures, Fluorine, Lithography, Optical lithography, Liquids, Metals

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Proceedings Article | 20 March 2015 Paper

High-sensitivity green resist material with organic solvent-free spin-coating and tetramethylammonium hydroxide-free water-developable processes for EB and EUV lithography

Satoshi Takei, Makoto Hanabata, Akihiro Oshima, Miki Kashiwakura, Takahiro Kozawa, Seiichi Tagawa

Proceedings Volume 9425, 94251P (2015) https://doi.org/10.1117/12.2081829

KEYWORDS: Photoresist processing, Lithography, Extreme ultraviolet lithography, Extreme ultraviolet, Etching, Polymers, Silicon, Oxygen, Chemical species, Thin films

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SPIE Journal Paper | 16 July 2014 Open Access

Planarizing material for reverse-tone step and flash imprint lithography

Tsuyoshi Ogawa, B. Michael Jacobsson, Ryan Deschner, William Bell, Michael Lin, Yuji Hagiwara, Satoshi Takei, Makoto Hanabata, C. Grant Willson

JM3, Vol. 13, Issue 03, 031302, (July 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.3.031302

KEYWORDS: Etching, Ultraviolet radiation, Lithography, Silicon, Scanning electron microscopy, Industrial chemicals, Coating, Liquids, Plasma etching, Epoxies

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Proceedings Article | 2 May 2014 Paper

Approach of pullulan derivatives to resist polymers for green lithography in eco-friendly optical NEMS and MEMS

Satoshi Takei, Akihiro Oshima, Kenta Ito, Kigenn Sugahara, Miki Kashiwakura, Tomoko Oyama, Takahiro Kozawa, Seiichi Tagawa, Makoto Hanabata

Proceedings Volume 9130, 913011 (2014) https://doi.org/10.1117/12.2045636

KEYWORDS: Lithography, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing, Polymers, Nanoelectromechanical systems, Etching, Microelectromechanical systems, Glucose, Dry etching

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Proceedings Article | 3 April 2010 Paper

Planarizing material for reverse-tone step and flash imprint lithography

Tsuyoshi Ogawa, Satoshi Takei, B. Michael Jacobsson, Ryan Deschner, William Bell, Michael Lin, Yuji Hagiwara, Makoto Hanabata, C. Grant Willson

Proceedings Volume 7637, 763708 (2010) https://doi.org/10.1117/12.846430

KEYWORDS: Silicon, Ultraviolet radiation, Etching, Oxygen, Silicon carbide, Lithography, Scanning electron microscopy, Coating, Liquids, Epoxies

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Proceedings Article | 31 March 2010 Paper

Development of spin-on hard mask materials under resist in nano imprint lithography

Satoshi Takei, Tsuyoshi Ogawa, Ryan Deschner, Kane Jen, Makoto Hanabata, C. Willson

Proceedings Volume 7639, 76391C (2010) https://doi.org/10.1117/12.853200

KEYWORDS: Lithography, Photomasks, Ultraviolet radiation, Etching, Photoresist processing, Nanoimprint lithography, Electron beam lithography, Oxygen, Resistance, Silicon

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Proceedings Article | 24 March 2006 Paper

Organic-inorganic hybrid materials for nanoimprint lithography

Junko Katayama, Shigeru Yamaki, Masahiro Mitsuyama, Makoto Hanabata

Proceedings Volume 6151, 61512F (2006) https://doi.org/10.1117/12.655053

KEYWORDS: Glasses, Silica, Ultraviolet radiation, Nanoimprint lithography, Particles, Nanoparticles, Organic hybrid materials, Refractive index, Statistical analysis, Polymers

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Proceedings Article | 15 September 1993 Paper

Design of PACs for high-performance photoresists (II): effect of number and orientation of DNQs and -OH of PACs on lithographic performances

Ryotaro Hanawa, Yasunori Uetani, Makoto Hanabata

Proceedings Volume 1925, (1993) https://doi.org/10.1117/12.154756

KEYWORDS: Picture Archiving and Communication System, Molecules, Photoresist materials, Lithography, Photoresist developing, Analytical research, Optical lithography, Absorption, Photolysis, Inspection

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Proceedings Article | 1 June 1992 Paper

Design of PACs for high-performance photoresists (I): role of di-esterified PACs having hindered -OH groups

Ryotaro Hanawa, Yasunori Uetani, Makoto Hanabata

Proceedings Volume 1672, (1992) https://doi.org/10.1117/12.59733

KEYWORDS: Molecules, Picture Archiving and Communication System, Photoresist materials, Photoresist developing, Lithography, Analytical research, Absorption, Photolysis

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Proceedings Article | 1 June 1991 Paper

Novolak design for high-resolution positive photoresists (IV): tandem-type novolak resin for high-performance positive photoresists

Makoto Hanabata, F. Oi, Akihiro Furuta

Proceedings Volume 1466, (1991) https://doi.org/10.1117/12.46364

KEYWORDS: Photoresist materials, Resistance, Photoresist developing, Image processing, Performance modeling, Picture Archiving and Communication System, Semiconducting wafers, Lithography, Molecules, Integrated circuits

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Proceedings Article | 1 June 1990 Paper

Novolac design for high-resolution positive photoresist (III): a selection principle of phenolic compounds for novolac resins

Makoto Hanabata, Akihiro Furuta

Proceedings Volume 1262, (1990) https://doi.org/10.1117/12.20102

KEYWORDS: Photoresist materials, Image processing, Image acquisition, Photoresist developing, Picture Archiving and Communication System, Semiconducting wafers, Photoresist processing, Image resolution, Carbon, Polymers

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Showing 5 of 29 publications

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