Quality of exposures in step and scan lithographic equipment highly depends on the synchronization of wafer and reticle stage. In order to increase the synchronization between the two stages, a high precision synchronization control method for scanning movement of reticle and wafer stage based on phase compensation of tracking error with the same frequency is presented. This method is quite different from the traditional ones, which just focus on designing the synchronization control systems of wafer and reticle stage. In this paper, with the analysis of relationship between MA, MSD and correlation of tracking errors, the estimation of tracking error and the phase compensation with same frequency, the performance of synchronization control for reticle and wafer stage is improved notably. Compared with the traditional ones, this method has advantage of higher precision, lower cost and greater portability.
Three-dimensional measurement and inspection is an area with growing needs and interests in many domains, such as integrated circuits (IC), medical cure, and chemistry. Among the methods, broadband light interferometry is widely utilized due to its large measurement range, noncontact and high precision. In this paper, we propose a spatial modulation depth-based method to retrieve the surface topography through analyzing the characteristics of both frequency and spatial domains in the interferogram. Due to the characteristics of spatial modulation depth, the technique could effectively suppress the negative influences caused by light fluctuations and external disturbance. Both theory and experiments are elaborated to confirm that the proposed method can greatly improve the measurement stability and sensitivity with high precision. This technique can achieve a superior robustness with the potential to be applied in online topography measurement.
The spectrum-integral Talbot lithography (STIL) was introduced into the fabrication of one-dimensional micro gratings using the broad-band UV illumination in this paper. In the process of spectrum-integral Talbot lithography, the self-images and π-phase-shifted images generated by different wave lengths overlap and integrate collectively to enormously extend the continuous depth-of-focus area since a certain distance away from the mask. As a result, the route of STIL proves to be of great potential for periodic frequency-doubling in good contrast without any complex improvement and operation to the traditional proximity lithographic system of UV mask aligner.
KEYWORDS: Control systems, Lithography, Digital signal processing, Control systems design, Signal processing, Feedback control, Device simulation, Mathematical modeling, Electromagnetism, Servomechanisms
Aiming at the high precision and efficiency requirements of Z-direction locating in Talbot lithography, a control system based on Voice Coil Motor (VCM) was designed. In this paper, we built a math model of VCM and its moving characteristic was analyzed. A double-closed loop control strategy including position loop and current loop were accomplished. The current loop was implemented by driver, in order to achieve the rapid follow of the system current. The position loop was completed by the digital signal processor (DSP) and the position feedback was achieved by high precision linear scales. Feed forward control and position feedback Proportion Integration Differentiation (PID) control were applied in order to compensate for dynamic lag and improve the response speed of the system. And the high precision and efficiency of the system were verified by simulation and experiments. The results demonstrated that the performance of Z-direction gantry was obviously improved, having high precision, quick responses, strong real-time and easily to expend for higher precision.
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