Mr. Liang Zhu Profile

Liang Zhu

at Grace Semiconductor Manufacturing Corp

SPIE Involvement:

Author

Publications (7)

SPIE Journal Paper | 1 October 2009

Study of the contour-based optical proximity correction methodology

Liang Zhu, Xiaohui Kang, Yili Gu, Steve Yang

JM3, Vol. 8, Issue 04, 043005, (October 2009) https://doi.org/10.1117/12.10.1117/1.3238544

KEYWORDS: Optical proximity correction, Computer simulations, Semiconducting wafers, Image quality, Photomasks, Lithography, Resolution enhancement technologies, Tolerancing, Diffusion, Image processing

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SPIE Journal Paper | 1 April 2009

Depth of focus enhancement for sub-110-nm technology by using KrF double-exposure lithography

Liang Zhu, Yingchun Zhang, Yili Gu, Steve Yang, Xiaohui Kang

JM3, Vol. 8, Issue 02, 023008, (April 2009) https://doi.org/10.1117/12.10.1117/1.3155515

KEYWORDS: Lithography, Critical dimension metrology, Double patterning technology, SRAF, Scanners, Image processing, Photomasks, Optical proximity correction, Resolution enhancement technologies, Semiconducting wafers

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Proceedings Article | 13 March 2009 Paper

Contour-based optical proximity correction

Brian Zhou, Liang Zhu, Yingchun Zhang, Yili Gu, Xiaohui Kang

Proceedings Volume 7275, 72751H (2009) https://doi.org/10.1117/12.814832

KEYWORDS: Optical proximity correction, Semiconducting wafers, Image processing, Critical dimension metrology, Metals, Structural design, Resolution enhancement technologies, Error control coding, Semiconductor manufacturing, Visualization

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Proceedings Article | 21 November 2007 Paper

Layout optimization for thick-film resist overlay metrology

Liang Zhu, James Li, Brian Zhou, Yili Gu, Steve Yang

Proceedings Volume 6827, 682726 (2007) https://doi.org/10.1117/12.756182

KEYWORDS: Overlay metrology, Design for manufacturing, Metrology, Lithography, Scanning electron microscopy, Semiconducting wafers, Photomasks, Reticles, Optical proximity correction, Optical alignment

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Proceedings Article | 21 November 2007 Paper

Slope-integrated methodology for OPC model calibration

Liang Zhu, Mark Lu, Dion King, Yili Gu, Steve Yang, Gensheng Gao

Proceedings Volume 6827, 682725 (2007) https://doi.org/10.1117/12.755663

KEYWORDS: Optical proximity correction, Data modeling, Calibration, Scanning electron microscopy, Metrology, Time metrology, Critical dimension metrology, Statistical modeling, Model-based design, Systems modeling

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Proceedings Article | 14 November 2007 Paper

Mask calibration dominated methodology for OPC matching

Liang Zhu, Mark Lu, Dion King, Yili Gu, Steve Yang, Lawrence Melvin

Proceedings Volume 6730, 67304D (2007) https://doi.org/10.1117/12.742173

KEYWORDS: Photomasks, Optical proximity correction, Calibration, Data modeling, Manufacturing, Semiconducting wafers, Metrology, Critical dimension metrology, Performance modeling, Databases

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Proceedings Article | 26 March 2007 Paper

Distributed model calibration using Levenberg-Marquardt algorithm

Mark Lu, Liang Zhu, Li Ling, Gary Zhang, Walter Chan, Xin Zhou

Proceedings Volume 6520, 65203C (2007) https://doi.org/10.1117/12.711564

KEYWORDS: Process modeling, Calibration, Computing systems, Distributed computing, Data modeling, Lithography, Semiconductors, Optimization (mathematics), Immersion lithography, Numerical stability

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Showing 5 of 7 publications

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