Dr. Li Cui Profile

Dr. Li Cui

at DuPont Electronics & Industrial

SPIE Involvement:

Author

Publications (11)

Proceedings Article | 10 April 2024 Presentation + Paper

Advanced EUV CAR small molecule compounds design and its impact to etch performance

Yinjie Cen, Jong Keun Park, Suzanne Coley, Benjamin Naab-Rafael, Li Cui, Emad Aqad, Stefan Alexandrescu, Rochelle Rena, Sylvie Eckert, Jason Behnke, ChoongBong Lee, Karen Petrillo

Proceedings Volume 12957, 129570A (2024) https://doi.org/10.1117/12.3010931

KEYWORDS: Etching, Photoresist materials, Extreme ultraviolet lithography

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Proceedings Article | 10 April 2024 Poster

Formulation and filtration strategies to reduce etch related defectivity of advanced chemically amplified EUV resist

Suzanne Coley, Jong Keun Park, Emad Aqad, Yinjie Cen, Li Cui, Conner Hoelzel, Benjamin Naab, Maria Melanson, Hung Tran, Stefan Alexandrescu, Rochelle Rena, Jason Behnke, Karen Petrillo

Proceedings Volume 12957, 129571Y (2024) https://doi.org/10.1117/12.3010919

KEYWORDS: Extreme ultraviolet, Stochastic processes, Etching, Photoresist processing, Photons, Manufacturing, Lithography, Design and modelling, Optical lithography, Materials processing

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Proceedings Article | 9 April 2024 Paper

Impact of increasing EUV absorption of CAR polymers on lithographic performance

Yinjie Cen, Emad Aqad, Li Cui, Suzanne Coley, Jong Keun Park, Benjamin Naab-Rafael, Rochelle Rena, Tyler Paul, Sylvie Eckert, Chunyi Wu, Mike Finch, Jason Behnke, ChoongBong Lee, Karen Petrillo

Proceedings Volume 12957, 129571Z (2024) https://doi.org/10.1117/12.3010961

KEYWORDS: Polymers, Extreme ultraviolet, Absorption, Extreme ultraviolet lithography, Photoresist materials, Line width roughness, Lithography

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Proceedings Article | 9 April 2024 Poster + Paper

Identifying trends in photoresist polymer properties to improve line and space defects

Benjamin Rafael-Naab, Jong Keun Park, Emad Aqad, Yinjie Cen, Suzanne Coley, Li Cui, Conner Hoelzel, Choong Bong Lee, Jason Behnke, Rochelle Rena, Sylvie Eckert, Stefan Alexandrescu, K. A. Niradha Sachinthani, Michael Finch, Karen Petrillo, Li Cheng

Proceedings Volume 12957, 129571S (2024) https://doi.org/10.1117/12.3010493

KEYWORDS: Defect inspection, Photoresist materials, Polymers, Line width roughness, Extreme ultraviolet lithography, Photoacid generators, Semiconducting wafers

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Proceedings Article | 1 May 2023 Presentation + Paper

Understanding etch properties of advanced chemically amplified EUV resist

Jong Keun Park, Emad Aqad, Yinjie Cen, Suzanne Coley, Li Cui, Conner Hoelzel, Benjamin Naab, Choongbong Lee, Rochelle Rena, Philjae Kang, You Rim Shin, David Limberg, Lei Zhang

Proceedings Volume 12499, 124990I (2023) https://doi.org/10.1117/12.2659178

KEYWORDS: Etching, Iodine, Extreme ultraviolet, Plasma, Plasma etching, X-ray photoelectron spectroscopy, Photoresist materials, Extreme ultraviolet lithography, Light absorption, Absorption

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Proceedings Article | 1 May 2023 Poster + Paper

Spin speed impact on photoresist thin film properties and EUV lithographic performance

Yinjie Cen, ChoongBong Lee, Li Cui, Suzanne Coley, Jong Keun Park, Benjamin Naab-Rafael, Emad Aqad, Rochelle Rena, Tyler Paul, Tom Penniman, Jason Behnke, Julia Early, Benjamin Foltz

Proceedings Volume 12498, 124981W (2023) https://doi.org/10.1117/12.2659101

KEYWORDS: Photoresist materials, Film thickness, Lithography, Extreme ultraviolet lithography, Line width roughness, Thin films, Surface roughness

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Proceedings Article | 1 May 2023 Poster + Paper

Considerations in the design of photoacid generators

Conner Hoelzel, Li Cui, Benjamin Naab, Jong Park, Philjae Kang, Kenneth Hernandez, Suzanne Coley, Stefan Alexandrescu, Rochelle Rena, James Cameron, Emad Aqad

Proceedings Volume 12498, 124981V (2023) https://doi.org/10.1117/12.2658981

KEYWORDS: Photoacid generators, Extreme ultraviolet lithography, Electrons, Extreme ultraviolet, Polymers, Design and modelling, Lithography, Materials properties, Line width roughness, Semiconducting wafers

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Proceedings Article | 22 February 2021 Presentation + Paper

Reducing the absorbance of a high etch resistant spin-on carbon hardmask

Anton Chavez, Iou-Sheng Ke, Sabrina Wong, Curtis Williamson, Li Cui, Paul LaBeaume, Jim Cameron, Shintaro Yamada

Proceedings Volume 11612, 116120F (2021) https://doi.org/10.1117/12.2583630

KEYWORDS: Etching, Absorbance, Carbon, Resistance, System on a chip, Reactive ion etching, Polymers, Image processing, Photoresist materials, Optical lithography

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Proceedings Article | 22 February 2021 Presentation + Paper

Design considerations for chemically amplified EUV resist materials

Emad Aqad, ChoongBong Lee, Suzanne Coley, Ke Yang, Li Cui, Manibarsha Goswami, Bhooshan Popere, Tomas Marangoni, James Cameron, James Thackeray

Proceedings Volume 11609, 116090I (2021) https://doi.org/10.1117/12.2583642

KEYWORDS: Extreme ultraviolet, Polymers, Absorption, Quantum efficiency, Imaging systems, Yield improvement, Systems modeling, Stochastic processes, Modulation, Lithography

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Proceedings Article | 23 March 2020 Paper

Planarized spin-on carbon hardmask

Iou-Sheng (Ike) Ke, Sheng Liu, Keren Zhang, Li Cui, Suzanne Coley, Shintaro Yamada, Jim Cameron

Proceedings Volume 11326, 1132617 (2020) https://doi.org/10.1117/12.2549015

KEYWORDS: System on a chip, Etching, Thin film coatings, Polymers, Resistance, Carbon, Chemical vapor deposition, Coating, Reactive ion etching, Silicon

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Proceedings Article | 23 March 2020 Paper

Design considerations for high etch resistance spin-on carbon underlayers

Li Cui, Iou-Sheng Ke, Anton Chavez, Keren Zhang, Paul LaBeaume, Suzanne Coley, Shintaro Yamada, Jim Cameron, Lei Zhang, William Marshall, Benjamin Foltz

Proceedings Volume 11326, 113261N (2020) https://doi.org/10.1117/12.2552024

KEYWORDS: System on a chip, Polymers, Etching, Resistance, Carbon, Polymer thin films, X-rays, FT-IR spectroscopy, Reactive ion etching

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Showing 5 of 11 publications

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