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Len Gasiorek
President/Chief Executive Officer at LC2 Engineering
SPIE Involvement:
Author
Publications (4)
Proceedings Article | 24 July 1996 Paper
Evaluation of the MEBES 4500 reticle writer to commercial requirements of 250-nm design rule IC devices
Frank Abboud, David Alexander, Thomas Coleman, Allen Cook, Leonard Gasiorek, Robert Naber, Frederick Raymond, Charles Sauer
Proceedings Volume 2793, (1996) https://doi.org/10.1117/12.245233
KEYWORDS: Reticles, Metrology, Calibration, Raster graphics, Composites, Photomasks, Manufacturing, Distortion, Mirror stabilization, Control systems
Proceedings Article | 8 December 1995 Paper
Method to produce a reference grid artifact for matching a MEBES 4500 system to an external reference
Jim DeWitt, Joe Watson, Thomas Coleman, Leonard Gasiorek, Michael Lubin, Robert Naber, William Wang, Keith Wires
Proceedings Volume 2621, (1995) https://doi.org/10.1117/12.228172
KEYWORDS: Metrology, Photomasks, Composites, Image processing, Software development, Phase shifts, Calibration, Lithography, Optical alignment, Reticles
Proceedings Article | 8 December 1995 Paper
Investigation of MEBES 4500 system composite performance
Jim DeWitt, Joe Watson, David Alexander, Allen Cook, Leonard Gasiorek, Mark Mayse, Robert Naber, Wayne Phillips, Charles Sauer
Proceedings Volume 2621, (1995) https://doi.org/10.1117/12.228189
KEYWORDS: Composites, Metrology, Reticles, Overlay metrology, Calibration, Phase shifts, Printing, Nickel, Image registration, Prototyping
Proceedings Article | 7 December 1994 Paper
MEBES 4000 optimization and characterization of MEBES 4500
Jim DeWitt, J. Millino, Joe Watson, Robert Dean, Frederick Raymond, D. McClure, Leonard Gasiorek, Frank Abboud, Robert Naber
Proceedings Volume 2322, (1994) https://doi.org/10.1117/12.195805
KEYWORDS: Composites, Photomask technology, Calibration, Photoresist processing, Control systems, Metrology, Process control, Photomasks, Optical lithography, Critical dimension metrology
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