CONFERENCE PROCEEDINGS
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Lei Yin
at Xi'an Institute of Applied Optics
SPIE Involvement:
Author
Publications (5)
Proceedings Article | 10 October 2013 Paper
A study on the fabrication of main scale of linear encoder using continuous roller imprint method
Shanjin Fan, Yongsheng Shi, Lei Yin, Long Feng, Hongzhong Liu
Proceedings Volume 8916, 89163W (2013) https://doi.org/10.1117/12.2035762
KEYWORDS: Manufacturing, Computer programming, Metals, Optics manufacturing, Image processing, Optical lithography, Nanoimprint lithography, Chromium, Precision measurement, Polishing
Proceedings Article | 16 August 2013 Paper
High illumination resolution test of low-light-level image intensifier
Xiaofeng Bai, Lei Yin, Yufeng Zhu, Yingping He, Zhuang Miao, Wen Hu, Zhipeng Hou, Hongli Shi
Proceedings Volume 8912, 89120L (2013) https://doi.org/10.1117/12.2033671
KEYWORDS: Image intensifiers, Image resolution, Spectral resolution, Light sources, Collimators, Microchannel plates, Objectives, Microscopes, Night vision, Imaging systems
Proceedings Article | 16 August 2013 Paper
Measurement conditions study on MCP current gain of the third generation low-light-level image intensifier tube
Lei Yin, Xiao-feng Bai, Liu Feng, Ying-ping He, Xiang Gao
Proceedings Volume 8912, 89120Q (2013) https://doi.org/10.1117/12.2033696
KEYWORDS: Microchannel plates, Image intensifiers, Light sources, Luminous efficiency, Image enhancement, Measurement devices, Ranging, Electrodes, Image processing, Ultraviolet radiation
Proceedings Article | 15 October 2012 Paper
Research on voltage characteristic of the third generation low-light-level image intensifier tube's output signal to noise ratio
Xiaofeng Bai, Lei Yin, Wen Hu, Feng Shi, Zhipeng Hou, Hongli Shi, Yingping He
Proceedings Volume 8419, 84192X (2012) https://doi.org/10.1117/12.975774
KEYWORDS: Signal to noise ratio, Image intensifiers, Microchannel plates, Luminous efficiency, Interference (communication), Night vision, Imaging devices, Photomultipliers, Imaging systems, Optical testing
SPIE Journal Paper | 1 April 2009
Novel imprint lithography process used in fabrication of micro/nanostructures in organic photovoltaic devices
Hongzhong Liu, Yucheng Ding, Weitao Jiang, Qin Lian, Lei Yin, Yongsheng Shi, Bingheng Lu
JM3, Vol. 8, Issue 02, 021170, (April 2009) https://doi.org/10.1117/12.10.1117/1.3142966
KEYWORDS: Nanoimprint lithography, Distortion, Polymers, Organic photovoltaics, Photovoltaics, Lithography, Photoresist processing, Semiconducting wafers, Diamond, Ultraviolet radiation
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