Mr. Lee Johnson Profile

Lee Johnson

at Ruda Optical

SPIE Involvement:

Author

Proceedings Article | 1 October 2024 Presentation + Paper

Correlations between wavefront data and image quality metrics in toleranced high-performance imaging systems

R. Hamilton, Martin Tangari Larrategui, Lee Johnson, Victor Densmore, Tilman Stuhlinger, Kenneth Castle, Kate Medicus

Proceedings Volume 13129, 1312904 (2024) https://doi.org/10.1117/12.3028341

KEYWORDS: Modulation transfer functions, Data modeling, Wavefronts, Tolerancing, Image quality, Lenses, Point spread functions, Monte Carlo methods, Imaging systems

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Ruda designs high performance imaging systems to meet difficult mission requirements, but these nearly diffraction limited systems often have small margins between the image quality of the nominal design and the required performance of the as-built system. Due to this we may spend significant resources designing and operating specialized test setups to ensure that results of MTF and Ensquared Energy (EE) measurements are well-calibrated and accurate. Alternatively, wavefront measurements – like those captured by wavefront sensors and interferometers – can be taken of the system to characterize the quality of the as-built system. Wavefront measurements are typically higher resolution, faster to setup, and quicker to measure than image quality metrics, making them particularly attractive for use when validating as-built system quality. Since the wavefront is related to the point spread function, and thereby the image quality, different wavefront measurements can contain information about the system MTF and EE. Thus, if the relationship between the wavefront and image quality metrics of interest can be established for an as-built system, it is possible to supplement or fully validate MTF and EE requirements from wavefront measurements. To investigate this relationship, we used Zemax OpticStudio to generate toleranced Monte Carlo trials of two nearly diffraction limited imaging systems designed by Ruda. The Monte Carlo models were then analyzed to form large data sets for statistical analysis. For wavefront data, the simulation produces single pass and double pass wavefront Zernike decompositions as well as wavefront root mean squared error over a range of object fields and visible wavelengths. For image quality data, the MTF at three spatial frequencies and the EE at two integration lengths are computed for the same fields and wavelengths as the wavefront data. These data sets are then processed to demonstrate that high degrees of correlation can exist between wavefront data and image quality metrics in toleranced high performance imaging systems, even when there is a difference in wavelength between the metrics. Sources of noise in these correlations are identified, and paths for supplementing or validating image quality requirement with correlated wavefront measurement data through machine learning are discussed.

Proceedings Article | 28 September 2023 Presentation + Paper

Optomechanical analysis of the alignment tolerance of threaded lens mounts

Martin Tangari Larrategui, Bianka Camacho, Paul Tulungen, Christian Baker, Victor Densmore, Lee Johnson, R. Hamilton, Kate Medicus, Kenneth Castle, Tilman Stuhlinger, Peter Mc. Niven

Proceedings Volume 12669, 126690G (2023) https://doi.org/10.1117/12.2677427

KEYWORDS: Tolerancing, Interfaces, Standards development, Cameras, Detector arrays, Optics manufacturing, Manufacturing, Image quality, Optical alignment, Sensors

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Proceedings Article | 3 October 2022 Presentation + Paper

Optomechanical analysis of compliant spacers in passively athermalized drop-in optical systems

Martin Tangari Larrategui, Victor Densmore, Lee Johnson, Christian Baker, Matthew Hevert, Bianka Camacho, Paul Tulungen, Peter McNiven, Kate Medicus, Kenneth Castle, Tilman Stuhlinger

Proceedings Volume 12222, 122220A (2022) https://doi.org/10.1117/12.2633612

KEYWORDS: Optomechanical design, Modulation transfer functions, Glasses, Mechanical engineering, Optical design, Metals, Tolerancing

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Proceedings Article | 20 August 2020 Presentation + Paper

Sensitivity analysis of the CTE and thermo-optical coefficients of a passively athermalized lens

Martin Tangari Larrategui, Victor Densmore, Lee Johnson, Christopher Giokaris, Kate Medicus, Kenneth Castle, Tilman Stuhlinger

Proceedings Volume 11488, 1148809 (2020) https://doi.org/10.1117/12.2569759

KEYWORDS: Glasses, Tolerancing, Imaging systems, Wavefronts, Refractive index, Aluminum, Optical components, Temperature metrology, Optics manufacturing

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Proceedings Article | 5 September 2017 Presentation + Paper

Lithographic manufacturing of adaptive optics components

R. Phillip Scott, Madison Jean, Lee Johnson, Ridley Gatlin, Ryan Bronson, Tom Milster, Michael Hart

Proceedings Volume 10401, 104011C (2017) https://doi.org/10.1117/12.2276508

KEYWORDS: Lithography, Adaptive optics, Manufacturing, Wavefront sensors, Optics manufacturing, Optical components, Optical fabrication, Prototyping

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Proceedings Article | 1 September 2017 Presentation + Paper

Results of the astrometry and direct imaging testbed for exoplanet detection

Eduardo Bendek, Ruslan Belikov, Eugene Pluzhnik, Olivier Guyon, Thomas Milster, Lee Johnson, Emily Finan, Justin Knight, Alexander Rodack

Proceedings Volume 10400, 104001G (2017) https://doi.org/10.1117/12.2274729

KEYWORDS: Staring arrays, Exoplanets, Distortion, Imaging systems, Planets, Exoplanetary science, Stars, Astronomical imaging, Mirrors, Diffraction

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Proceedings Article | 17 April 2015 Paper

Process optimization for a 3D optical coupler and waveguide fabrication on a single substrate using buffer coat material

Chris Summitt, Sunglin Wang, Lee Johnson, Melissa Zaverton, Tao Ge, Tom Milster, Yuzuru Takashima

Proceedings Volume 9374, 937415 (2015) https://doi.org/10.1117/12.2080425

KEYWORDS: Waveguides, Mirrors, Photomasks, Optical alignment, Thin film coatings, Lithography, Cladding, Integrated optics, Silicon, Chromium

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Proceedings Article | 13 March 2015 Paper

High contrast and metal-less alignment process for all-polymer optical interconnect devices

Tao Ge, Jilin Yang, Chris Summitt, Sunglin Wang, Lee Johnson, Melissa Zaverton, Tom Milster, Yuzuru Takashima

Proceedings Volume 9374, 93741F (2015) https://doi.org/10.1117/12.2079620

KEYWORDS: Imaging systems, Phase contrast, Optical alignment, Mirrors, Polymers, Lithography, Optical interconnects, Waveguides, Microscopes, Objectives

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Proceedings Article | 15 September 2014 Paper

Optical characterization of CMOS compatible micro optics fabricated by mask-based and mask-less hybrid lithography

Sunglin Wang, Chris Summitt, Lee Johnson, Melissa Zaverton, Tom Milster, Yuzuru Takashima

Proceedings Volume 9170, 91700F (2014) https://doi.org/10.1117/12.2062414

KEYWORDS: Mirrors, Lithography, Interferometers, Scanning electron microscopy, Surface roughness, Objectives, Optical fabrication, Thin film coatings, Waveguides, Profilometers

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SPIE Journal Paper | 6 August 2014

Central aperture detection for auto direct read-write photoresist fabrication and inspection

Justin Sierchio, Melissa Zaverton, Lee Johnson, Victor Densmore, Thomas Milster

OE, Vol. 53, Issue 08, 084104, (August 2014) https://doi.org/10.1117/12.10.1117/1.OE.53.8.084104

KEYWORDS: Image processing, Inspection, Raster graphics, Photoresist materials, Defect detection, Sensors, Digital filtering, Optical lithography, Laser scanners, Image registration

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Proceedings Article | 7 March 2014 Paper

Micro-optics fabrication by mask-based and mask-less mixed lithography process towards 3D optical circuits

Chris Summitt, Sunglin Wang, Lee Johnson, Melissa Zaverton, Tao Ge, Tom Milster, Yuzuru Takashima

Proceedings Volume 8974, 89740C (2014) https://doi.org/10.1117/12.2045234

KEYWORDS: Lithography, Mirrors, Optical circuits, Optical alignment, Photomasks, Fabrication, Integrated optics, Micro optics, Photoresist materials, Double patterning technology

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Proceedings Article | 26 September 2013 Paper

Exoplanet detection and characterization using combined coronagraphy and sub-UAS astrometry from space

Eduardo Bendek, Olivier Guyon, Ruslan Belikov, S. Mark Ammons, Thomas Milster, Young-Sik Kim, Lee Johnson

Proceedings Volume 8864, 886405 (2013) https://doi.org/10.1117/12.2024316

KEYWORDS: Stars, Coronagraphy, Distortion, Mirrors, Calibration, Imaging systems, Space telescopes, Exoplanets, Exoplanetary science, Cameras

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Proceedings Article | 5 March 2013 Paper

Flexible micro-optics fabrication by direct laser writing toward CMOS compatible 3D optical circuit

Chris Summitt, Sunglin Wang, Lee Johnson, Melissa Zaverton, Tom Milster, Yuzuru Takashima

Proceedings Volume 8613, 86130K (2013) https://doi.org/10.1117/12.2004996

KEYWORDS: Mirrors, Modulation, Silicon, Photosensitive materials, Light sources, Waveguides, Multiphoton lithography, Silicon photonics, Maskless lithography, Raster graphics

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Showing 5 of 13 publications

Conference Committee Involvement (1)

Optical System Alignment, Tolerancing, and Verification XVI

3 August 2025 | San Diego, California, United States

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