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Dr. Kyoung-Seon Kim
at KAIST
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Author
Publications (4)
Proceedings Article | 29 March 2006 Paper
Synthesis of photobleachable deep UV resists based on single component nonchemically amplified resist system
Proceedings Volume 6153, 61532H (2006) https://doi.org/10.1117/12.660634
KEYWORDS: Polymers, Deep ultraviolet, Lithography, Etching, Polymerization, Absorption, Photoresist processing, Lamps, Printing, FT-IR spectroscopy
Proceedings Article | 4 May 2005 Paper
Synthesis of copolymers containing diazoketo groups and their application as DUV resists
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599493
KEYWORDS: Polymers, Ultraviolet radiation, Deep ultraviolet, Photoresist materials, Lithography, FT-IR spectroscopy, Semiconducting wafers, Lamps, Absorption, Absorbance
Proceedings Article | 4 May 2005 Paper
Bilayer resists based on polyhedral oligomeric silsesquioxane for 193-nm lithography
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599622
KEYWORDS: Lithography, Silicon, Ultraviolet radiation, Absorbance, Standards development, Polymers, Semiconducting wafers, Sodium, Photomicroscopy, Solids
Proceedings Article | 12 June 2003 Paper
Synthesis of norbornene copolymers with diazo groups and their application as DUV resists
Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485104
KEYWORDS: Polymers, Deep ultraviolet, Ultraviolet radiation, Lithography, FT-IR spectroscopy, Photoresist materials, Absorbance, Sodium, Polymerization, Semiconducting wafers
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