Prof. KukJin Chun Profile

Prof. KukJin Chun

at Seoul National Univ

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 19 April 2002 Paper

Reduction of spurious resonance in rf package using silicon micromachining

Wonseo Choi, Joonyeop Lee, Seongsu Moon, Seonho Seok, KukJin Chun

Proceedings Volume 4755, (2002) https://doi.org/10.1117/12.462872

KEYWORDS: Silicon, Metals, Semiconducting wafers, Packaging, Micromachining, Electroplating, Reflection, Copper, Glasses, Radio frequency circuits

Read Abstract +

Proceedings Article | 20 October 2000 Paper

MEMS variable capacitor for one-chip rf front end

Seonho Seok, Chul Nam, KukJin Chun

Proceedings Volume 4230, (2000) https://doi.org/10.1117/12.404909

KEYWORDS: Capacitors, Silicon, Glasses, Microelectromechanical systems, Capacitance, Crystals, Gold, Polishing, Chemical mechanical planarization, Oscillators

Read Abstract +

Proceedings Article | 20 October 2000 Paper

Electroplated solenoid-type inductors for CMOS rf CO

Chul Nam, Wonseo Choi, KukJin Chun

Proceedings Volume 4230, (2000) https://doi.org/10.1117/12.404888

KEYWORDS: Inductance, Capacitors, Copper, Electroplating, Optical lithography, Bridges, Skin, Plating, Device simulation, Glasses

Read Abstract +

Proceedings Article | 1 October 1999 Paper

Inertial sensing paradigm using an accelerometer array: XL-array

Seo Kim, KukJin Chun

Proceedings Volume 3892, (1999) https://doi.org/10.1117/12.364484

KEYWORDS: Capacitance, Capacitors, Electrodes, Silicon, Sensors, Surface micromachining, Signal to noise ratio, Navigation systems, Low pressure chemical vapor deposition, Manufacturing

Read Abstract +

Proceedings Article | 14 August 1997 Paper

Profile characteristics and simulation of chemically amplified resists in electron-beam lithography

Young-Mog Ham, Changbuhm Lee, Soo-Hwan Kim, KukJin Chun

Proceedings Volume 3183, (1997) https://doi.org/10.1117/12.280536

KEYWORDS: Chemically amplified resists, Lithography, Chemical analysis, Optical simulations, Electron beam lithography, Gaussian beams

Read Abstract +

Proceedings Article | 27 May 1996 Paper

Simulation and modeling of electron-beam lithography for delineating 0.2-um line and space patterns

Young-Mog Ham, Changbuhm Lee, Taewon Suh, KukJin Chun, Jong-Duk Lee

Proceedings Volume 2723, (1996) https://doi.org/10.1117/12.240466

KEYWORDS: Monte Carlo methods, Electron beam lithography, Photoresist processing, Optical simulations, Polymethylmethacrylate, Deep ultraviolet, Electron beams, Scattering, 3D modeling, Lithography

Read Abstract +

Showing 5 of 6 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years