A photomask is a high precision plate used in the lithographic process for the fabrication of microcomponents and it is an important prerequisite for microfabrication. A binary photomask is composed of tranasparent and opaque elements wich from one layer of a pattern. Photomasks are currently fabricated using lithographic process, which is complex and time consuming because of several steps involved in the fabrication process. In order to address this issue, a simple technique is reported in this paper which is a single-step process. The required pattern is transferred to mask blank by direct writing with femtosecond laser pulses without the aid of photoresist. The opaque layer of the mask blank is removed by femtosecond laser ablation. An acousto-optic device based non-mechanical scanning system immune to effects of vibration has been developed to scan the laser beam with high positional accuracy and scan speed. The applicability of this technique for microfabrication has been proved conclusively by fabricating microfeatures with the photomask fabricated by this technique.
Planar gratings have wide applications and, till date, many methods for the fabrication of gratings have been reported. Ultrashort pulse laser has been used for the machining of gratings primarily due to its ability of direct ablation and its capability to fabricate sub-wavelength structures. In this paper, we present a novel direct ablation technique for the fabrication of planar gratings by interfering ultrashort pulses in a novel optical configuration. This technique not only simplifies the optical setup, but also immunizes the system to extraneous and inherent vibrations, thus enabling planar gratings of good edge acuity. In addition, this technique ensures that gratings are formed only on the focal point. The grating line width can also be adjusted without much change to the optical configuration. With this technique, we have successfully fabricated planar grating of different line-widths on a silicon substrate. Effect of pulse number, and the laser threshold on the grating quality has been qualitatively studied using SEM analysis. This method offers a novel technique for the fabrication of surface relief profile on the metal surface by direct ablation. The optical setup is immune to vibration, at the same time cost effective and fast. Gratings have wide applications and this fabrication technique can be realized commercially.
In this paper, a two-axis-scanning Laser Doppler Vibrometer for micro-scale object dynamic behavior characterization is described. The system employs a two-axis acousto-optic deflectors and a telecentric lens to achieve high-precision and high-speed scanning. The newly developed vibrometer was used to measure the dynamic behavior of an entire AFM cantilever operated in free air. The 120 micrometers long, 25 micrometers wide micro-cantilever dynamic response was measured at different positions with 2 micrometers spatial resolution.
Dynamic parameter measurement is very important for disk- slider interface design. Laser Doppler Vibrometer has been the most favorite instrument for this purpose due to its non-contact, high accuracy and high resolution. However, LDV can only give the dynamic data of a particular locate on the entire feature. In order to get the whole field data, a laser beam scanning mechanism has to be implemented. Currently, motor-driven scanning mirror is used to move the measurement probe from one point to another. The mechanical vibrations of the scanning mirror will deteriorate the measurement accuracy. Moreover current scanning LDV can not avoid Pseudo error introduced by the scanning angle. This paper describes a novel scanning LDV optical system embodied an acousto-optic deflector scanning mechanism. It can not only eliminate the Pseudo error, but also improve the measurement accuracy since there is no mechanical motion involved. Promising results have been obtain from the preliminary experiments carried out for measurement of out- of-plane runout of magnetic disk, vibration of slider relative to the surface of the rotating magnetic disk, and flying height along the traveling edge.
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