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Dr. Koji Tsunekawa
at Canon ANELVA Corp
SPIE Involvement:
Author
Publications (1)
Proceedings Article | 28 August 2014 Paper
Status and outlook of STT-MRAM development
T. Min, G. Kar, J. Swerts, S. Mertens, S. Coseman, J. Bekaert, K. Xu, L. Souriau, D. Radisic, H. Okuyama, K. Nishimura, T. Seino, K. Tsunekawa
Proceedings Volume 9167, 91671B (2014) https://doi.org/10.1117/12.2063079
KEYWORDS: Resistance, Annealing, Lithography, Electrodes, Switching, Magnetism, Optical lithography, Deposition processes, Extreme ultraviolet, Ferromagnetics
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