Mr. Katsushi Makino Profile

Katsushi Makino

at Nikon Corp

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Author

Publications (8)

Proceedings Article | 22 February 2021 Poster + Presentation + Paper

Absolute coordinate system adjustment and calibration by using standalone alignment metrology system

Satoshi Ando, Haruki Saito, Sayuri Tanaka, Tetsuya Kawata, Takanobu Okamoto, Katsushi Makino, Yuji Shiba, Takehisa Yahiro, Jun Ishikawa, Masahiro Morita

Proceedings Volume 11611, 116112S (2021) https://doi.org/10.1117/12.2583695

KEYWORDS: Optical alignment, Metrology, Lithography, Calibration, Distortion, Semiconducting wafers, Overlay metrology, Scanners

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Proceedings Article | 20 March 2020 Paper

High-order field distortion correction using standalone alignment technology with modeling and sampling optimization

Takehisa Yahiro, Katsushi Makino, Haruki Saito, Steven Tottewitz, Boris Habets, Patrick Lomtscher, Jiro Hanaue

Proceedings Volume 11325, 113251Y (2020) https://doi.org/10.1117/12.2551603

KEYWORDS: Distortion, Semiconducting wafers, Optical alignment, Optimization (mathematics), Scanners, Overlay metrology, Process control, Reticles, Data modeling

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Proceedings Article | 31 March 2014 Paper

Scanner performance predictor and optimizer in further low-k1 lithography

Hajime Aoyama, Toshiharu Nakashima, Taro Ogata, Shintaro Kudo, Naonori Kita, Junji Ikeda, Ryota Matsui, Hajime Yamamoto, Ayako Sukegawa, Katsushi Makino, Masayuki Murayama, Kazuo Masaki, Tomoyuki Matsuyama

Proceedings Volume 9052, 90520A (2014) https://doi.org/10.1117/12.2046547

KEYWORDS: Reticles, Photomasks, Scanners, Critical dimension metrology, Semiconducting wafers, Lithography, Electroluminescence, Error analysis, Distortion, Data modeling

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Proceedings Article | 12 April 2013 Paper

Mix-and-match overlay performance of the NSR-S622D immersion scanner

Katsushi Makino, Takahisa Kikuchi, Satoru Sasamoto, Park Hongki, Akiko Mori, Nobuyuki Takahashi, Shinji Wakamoto

Proceedings Volume 8683, 86830Q (2013) https://doi.org/10.1117/12.2010875

KEYWORDS: Distortion, Semiconducting wafers, Source mask optimization, Reticles, Overlay metrology, Scanners, Metrology, Lithography, Optical alignment, Motion models

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Proceedings Article | 13 March 2012 Paper

Spacer process and alignment assessment for SADP process

L. Lattard, M. McCallum, R. Morton, T. Fujiwara, K. Makino, A. Tokui, N. Takahashi, S. Sasamoto

Proceedings Volume 8326, 832604 (2012) https://doi.org/10.1117/12.916362

KEYWORDS: Optical alignment, System on a chip, Lithography, Semiconducting wafers, Image processing, Optical lithography, Scanning electron microscopy, Scanners, Signal processing, Photoresist processing

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Proceedings Article | 13 March 2012 Paper

High overlay accuracy for double patterning using an immersion scanner

Yuji Shiba, Katsushi Makino, Yasuhiro Morita, Chihaya Motoyoshi, Hajime Yamamoto, Jin Udagawa, Takahisa Kikuchi, Yosuke Shirata, Yuuki Ishii

Proceedings Volume 8326, 83260T (2012) https://doi.org/10.1117/12.916246

KEYWORDS: Double patterning technology, Optical alignment, Distortion, Semiconducting wafers, Overlay metrology, Reticles, Scanners, Cooling systems, Lithography, Semiconductor manufacturing

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Proceedings Article | 23 March 2011 Paper

Scanner alignment performance for double patterning

L. Lattard, M. McCallum, R. Morton, C. Lapeyre, K. Makino, A. Tokui, N. Takahashi, T. Fujiwara

Proceedings Volume 7973, 79730I (2011) https://doi.org/10.1117/12.878953

KEYWORDS: Optical alignment, Double patterning technology, Scanners, Lithography, Overlay metrology, Optical lithography, Critical dimension metrology, Semiconducting wafers, Double positive medium, Etching

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Proceedings Article | 24 March 2009 Paper

Improve scanner matching using automated real-time feedback control via scanner match maker (SMM)

Shian-Huan (Cooper) Chiu, Sheng-Hsiung Yu, Min-Hin Tung, Lei-Ken Wu, Ya-Tsz Yeh, James Manka, Chao-Tien (Healthy) Huang, John Robinson, Chin-Chou (Kevin) Huang, David Tien, YuYu Chen, Katsushi Makino, Jium-Ming Lin

Proceedings Volume 7272, 72723E (2009) https://doi.org/10.1117/12.814186

KEYWORDS: Scanners, Distortion, Semiconducting wafers, Overlay metrology, Phase modulation, Feedback control, Process control, Optical lithography, Metrology, Inspection

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Showing 5 of 8 publications

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