Mr. Joseph T. Parry Profile

Joseph T. Parry

Director Litho Applications at Nikon Precision Inc

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Publications (2)

Proceedings Article | 5 July 2000 Paper

Implementation of an automated feedback focus control methodology for Nikon (NSR) i-line and DUV steppers and scanners

Ivan Lalovic, Joseph Parry, Brett Gwynn, Christopher Silsby

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389073

KEYWORDS: Visualization, Semiconducting wafers, Metrology, Lithography, Feedback control, Diagnostics, Reticles, Deep ultraviolet, Photoresist materials, Scanners

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Proceedings Article | 29 June 1998 Paper

Impacts of reticle and wafer elasticity control on overall alignment management strategy

Etsuya Morita, Masaharu Kawakubo, Frank Leung, Sean McNamara, Joseph Parry

Proceedings Volume 3334, (1998) https://doi.org/10.1117/12.310779

KEYWORDS: Semiconducting wafers, Reticles, Optical alignment, Overlay metrology, Printing, Transmittance, Temperature metrology, Manufacturing, Sensors, Distortion

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