We configured a spectroscopic ellipsometer (SE) optical system with a micrometer spot size using reflective objectives. Two reflective objectives, based on the Schwarzchild configuration, are positioned just before and after the beam reflects on the sample. While we achieved the appropriate angle of incidence and numerical aperture (NA) of the light beam on the sample by utilizing an off-axis reflection configuration for the objectives, the polarization state of light is significantly influenced due to its asymmetric beam path, beam focusing, and reflection on the mirror surfaces. Therefore, we developed a proper model to describe the polarization state change arising from the effect of reflective objectives for our custom Spectroscopic Ellipsometer optical system and demonstrated its applicability for thin film structures.
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