Mr. Jong-Min Kim Profile

Jong-Min Kim

Director at Photronics, Inc.

SPIE Involvement:

Author

Publications (13)

Proceedings Article | 16 September 2013 Paper

Mask contamination study in electron and ion beam repair system

Hyo-Jin Ahn, Jong-Min Kim, Dong-Seok Lee, Gyu-Yong Lee, Dong-Heok Lee, Sang-Soo Choi

Proceedings Volume 8880, 88801T (2013) https://doi.org/10.1117/12.2026123

KEYWORDS: Reflectivity, Contamination, Inspection, Ions, Ion beams, Reflection, Chromium, Silicon, Mask making, Microscopes

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Proceedings Article | 30 June 2012 Paper

A simulation of chrome migration and its prevention in photomask

Jong-Min Kim, Ik-Boum Hur, Dong-Heok Lee, Sang-Soo Choi

Proceedings Volume 8441, 844104 (2012) https://doi.org/10.1117/12.977217

KEYWORDS: Chromium, Photomasks, Solar energy, Critical dimension metrology, Diffusion, Photovoltaics, Scanning electron microscopy, Scanners, Semiconducting wafers

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Proceedings Article | 14 October 2011 Paper

Study on the soft defects related to dry etch process of phase shift mask

Young-Jin An, Jong-Min Kim, Byung-Sun Kang, Dong-Heok Lee, Sang-Soo Choi

Proceedings Volume 8166, 81661L (2011) https://doi.org/10.1117/12.896776

KEYWORDS: Etching, Dry etching, Chromium, Inspection, Aluminum, Fluorine, Coating, Ions, Phase shifts, Photomasks

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Proceedings Article | 25 September 2010 Paper

Advanced photomask cleaning for 32nm and beyond

Jong-Min Kim, Young-Jin An, Dong-Seok Lee, Hyo-Jin Ahn, Hyun-Ju Jung, Jae-Chul Lee, Dong-Heok Lee, Sang-Soo Choi

Proceedings Volume 7823, 78232X (2010) https://doi.org/10.1117/12.864532

KEYWORDS: Air contamination, Acoustics, Inspection, Scattering, Mask cleaning, Photomasks, SRAF, Critical dimension metrology, Particles, Scanning electron microscopy

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Proceedings Article | 24 March 2009 Paper

Haze generation model and prevention techniques for sulfate free cleaned mask

Manish Patil, Jong-Min Kim, Ik-Boum Hur, Sang-Soo Choi

Proceedings Volume 7272, 72721X (2009) https://doi.org/10.1117/12.816350

KEYWORDS: Air contamination, Chromium, Photomasks, Pellicles, Ions, Surface properties, Semiconducting wafers, Thermodynamics, Adsorption, Molecules

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Proceedings Article | 19 May 2008 Paper

Post cleaned surface modification treatment to prevent near pellicle haze generation in sulfate free cleaned ArF EAPSM

Manish Patil, Jong-Min Kim, Sung-Mo Jung, Ik-Boum Hur, Sang-Soo Choi, Yong Hyun Lee

Proceedings Volume 7028, 70282C (2008) https://doi.org/10.1117/12.793086

KEYWORDS: Air contamination, Pellicles, Photomasks, Ions, Chromium, Quartz, Deep ultraviolet, Semiconducting wafers, Transmittance, Surface properties

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Proceedings Article | 1 November 2007 Paper

A study of haze generation as thin film materials

Ju-Hyun Kang, Han-Sun Cha, Sin-Ju Yang, Chul-Kyu Yang, Jin-Ho Ahn, Kee-Soo Nam, Jong-Min Kim, Manish Patil, Ik-Bum Hur, Sang-Soo Choi

Proceedings Volume 6730, 67304K (2007) https://doi.org/10.1117/12.746684

KEYWORDS: Air contamination, Ions, Nitrogen, Metals, Thin films, Photomasks, Chemical analysis, Inspection, Scanning probe microscopy, Quartz

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Proceedings Article | 1 November 2007 Paper

Haze generation effect by pellicle and packing box on photomask

Jong-Min Kim, Manish Patil, Woo-Gun Jeong, Ik-Boum Hur, Cheol Shin, Sung-Mo Jung, Moon-Hwan Choi, Sang-Soo Choi

Proceedings Volume 6730, 67304O (2007) https://doi.org/10.1117/12.747121

KEYWORDS: Photomasks, Air contamination, Pellicles, Ions, Contamination, Adhesives, Fluorine, Raman spectroscopy, Glasses, Inspection

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Proceedings Article | 14 May 2007 Paper

Threshold residual ion concentration on photomask surface to prevent haze defects

Jong-Min Kim, Jae-Chul Lee, Dong-Shik Kang, Dong-Heok Lee, Chul Shin, Moon-Hwan Choi, Sang-Soo Choi

Proceedings Volume 6607, 66071Z (2007) https://doi.org/10.1117/12.728982

KEYWORDS: Ions, Air contamination, Photomasks, Semiconducting wafers, Transmittance, Chromium, Lithographic illumination, Laser damage threshold, Mask cleaning, Profiling

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SPIE Journal Paper | 1 January 2007

Control of chemical residue on photomasks using thermal treatment

Han-Byul Kang, Yong-Dae Kim, Jong-Min Kim, Hyun-Joon Cho, Moon-Hwan Choi, Sang-Soo Choi, Jee-Hwan Bae, Cheol-Woong Yang

JM3, Vol. 6, Issue 01, 013008, (January 2007) https://doi.org/10.1117/12.10.1117/1.2435715

KEYWORDS: Ions, Air contamination, Photomasks, Chromatography, Potassium, Phase shifts, Lithography, Thermal effects, Chemical analysis, Materials science

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Proceedings Article | 8 November 2005 Paper

A study of organic contamination control on photomask surface for 65-nm tech node

Jong-Min Kim, Han-Byul Kang, Yong-Dae Kim, Hyun-Joon Cho, Sang-Soo Choi

Proceedings Volume 5992, 59923D (2005) https://doi.org/10.1117/12.631267

KEYWORDS: Air contamination, Photomasks, Natural surfaces, Chromium, Contamination control, Chemical analysis, Ions, Mask cleaning, Laser irradiation, Carbon

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Proceedings Article | 28 June 2005 Paper

A study for the control of chemical residuals on photomasks by using a thermal treatment for 65-nm node

Han-Byul Kang, Jong-Min Kim, Yong-Dae Kim, Hyun-Joon Cho, Sang-Soo Choi

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617117

KEYWORDS: Air contamination, Ions, Photomasks, Humidity, Chromatography, Ultraviolet radiation, Semiconducting wafers, Chemical analysis, Manufacturing, 193nm lithography

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Proceedings Article | 10 May 2005 Paper

Effective control of photomask surface chemical residuals through thermal treatment

Han-Byul Kang, Jong-Min Kim, Yong-Dae Kim, Hyun-Joon Cho, Sang-Soo Choi

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.599871

KEYWORDS: Ions, Photomasks, Air contamination, Chromatography, 193nm lithography, Thermal effects, Transmittance, Scanning probe microscopy, Semiconducting wafers, Lithography

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Showing 5 of 13 publications

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