Dr. Jin Choi Profile

Dr. Jin Choi

VP of Technology at Samsung Electronics Co. Ltd.

SPIE Involvement:

Conference Program Committee | Author

Publications (39)

Proceedings Article | 12 November 2024 Open Access

EUV mask technologies: evolution and ecosystem for devices

Jin Choi

Proceedings Volume 13216, 1321603 (2024) https://doi.org/10.1117/12.3037237

KEYWORDS: Extreme ultraviolet, Industry, Extreme ultraviolet lithography, Lithography, Semiconductors, Ecosystems, Organization management

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Proceedings Article | 12 November 2024 Presentation + Paper

Requirements and strategies of High-NA EUV mask using MBMW

Yoonjung Cho, Inhwan Noh, Jongmun Park, Byungsup Ahn, Hongsu Kim, Minji Kim, Yuri Kim, Ueba Ryosuke, Changyoung Jeong, Jin Choi, Sang-Hee Lee

Proceedings Volume 13216, 132160E (2024) https://doi.org/10.1117/12.3034574

KEYWORDS: Extreme ultraviolet, Photomasks, Lithography, Optical lithography, Extreme ultraviolet lithography, Line edge roughness, Electron beam lithography, 3D mask effects

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Proceedings Article | 26 August 2024 Paper

EUV mask inspection technologies with actinic tool for DRAM and logic lithography

Cheolki Min, Daeho Sung, Jeongmin Kim, Hongcheol Kim, Sobin Ji, Hakseung Han, Jonggul Doh, Inyong Kang, Jin Choi, Sanghee Lee, Satoru Doi, Toshiyuki Todoroki, Hiroki Miyai, Jaehee Han, Youngsub Jang

Proceedings Volume 13177, 131770P (2024) https://doi.org/10.1117/12.3031837

KEYWORDS: Inspection, Extreme ultraviolet, Deep ultraviolet, Pellicles, Optical proximity correction, Logic, SRAF, Lithography, Image resolution, Defect inspection

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Proceedings Article | 26 August 2024 Paper

Improvement of mask pattern placement error using novel resist charging control methodology in multi-beam mask writer

Hyoyeon Kim, Hyungrae Noh, Wonsik Shin, Kangho Park, Youngjae Lee, Sangho Jo, Youngsu Sung, Hojune Lee, Heebom Kim, Jin Choi, Sanghee Lee, Alexander Egl, Gottfried Hochleitner, Matthias Kühmayer, Matthias Liertzer, Francesco Massa, Mathias Tomandl

Proceedings Volume 13177, 131770V (2024) https://doi.org/10.1117/12.3032199

KEYWORDS: Error analysis, Semiconducting wafers, Calibration, Logic, Overlay metrology, Logic devices, Simulations, Palladium, Optical alignment, Image registration, Photomasks

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Proceedings Article | 10 April 2024 Presentation

MBMW's comprehensive requirements and roles for next EUV era and its mass production

Inhwan Noh, Jongmun Park, Heebom Kim, Jin Choi, Sang-Hee Lee, Hojune Lee, Byung-Sup Ahn, Youngsu Sung

Proceedings Volume PC12956, PC1295605 (2024) https://doi.org/10.1117/12.3009572

KEYWORDS: Extreme ultraviolet, Logic

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Proceedings Article | 22 November 2023 Presentation

Multi-column e-beam inspection system for advanced EUV reticles

Kunal Rohilla, David Aupperle, Wenxing Jiang, Seungtak Seo, Sanguk Park, Jongju Park, Jin Choi, Sanghee Lee, Min Choo, Yeonjeong Choi, Paul Chung

Proceedings Volume PC12750, PC127500E (2023) https://doi.org/10.1117/12.3007916

KEYWORDS: Inspection, Reticles, Extreme ultraviolet, Quality control, Manufacturing, Laser systems engineering, Laser manufacturing, Industry, Extreme ultraviolet lithography, Design and modelling

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Proceedings Article | 21 November 2023 Presentation + Paper

PEC-aware MPC for CD quality improvement

Soeun Shin, Boram Lee, Sukho Lee, Eok bong Kim, Mina Kim, Jin Choi, Sanghee Lee, Yutaro Sato, Ahmad Syukri, Itaru Ono, Yohei Torigoe

Proceedings Volume 12751, 127510V (2023) https://doi.org/10.1117/12.2687866

KEYWORDS: Extreme ultraviolet, Critical dimension metrology, Scattering, Modeling, Mathematical optimization, Algorithm development, Point spread functions, Lithography, Backscatter, Semiconductors

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Proceedings Article | 21 November 2023 Presentation + Paper

Novel method for precise curved EUV mask CD characterization by adopting machine learning

Jaeseo Lee, Inhwan Noh, Youngsu Sung, Heebom Kim, Ji-hoon Kang, Seunghye Kim, Jin Choi

Proceedings Volume 12751, 127510B (2023) https://doi.org/10.1117/12.2687781

KEYWORDS: Education and training, Machine learning, Data modeling, Algorithm development, Modeling, 3D modeling, Feature extraction, Design and modelling, Artificial neural networks, Optical proximity correction

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Proceedings Article | 1 December 2022 Paper

Assessment of contour modeling readiness for curvilinear masks

Raewon Yi, Sukho Lee, Jin Choi, Eok Bong Kim, Sanghee Lee

Proceedings Volume 12293, 1229308 (2022) https://doi.org/10.1117/12.2641692

KEYWORDS: Scanning electron microscopy, Process modeling, Photomasks, Data modeling, Error analysis, Image processing, Statistical analysis, Performance modeling, Lithography, Etching

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Proceedings Article | 16 September 2022 Paper

Ecosystem required for EUV mask curvilinear pattern

Sukho Lee, Raewon Yi, Jihyeon Choi, Eok Bong Kim, Jin Choi, Sanghee Lee

Proceedings Volume 12325, 123250V (2022) https://doi.org/10.1117/12.2642025

KEYWORDS: Scanning electron microscopy, Photomasks, Ecosystems, Extreme ultraviolet, Error analysis, Manufacturing

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Proceedings Article | 16 September 2022 Paper

Status of curvilinear data format working group

Jin Choi, Soo Ryu, Sukho Lee, Minah Kim, Sanghee Lee, Peter Buck, Bhardwaj Durvasula, Sayalee Gharat, Vlad Liubich

Proceedings Volume 12325, 1232508 (2022) https://doi.org/10.1117/12.2641557

KEYWORDS: Photomasks, Optical proximity correction, Extreme ultraviolet, Optical lithography, Mask making

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SPIE Journal Paper | 1 November 2021 Open Access

Study on various curvilinear data representations and their impact on mask and wafer manufacturing

Jin Choi, Soo Ryu, Sukho Lee, Minah Kim, JoonSoo Park, Peter Buck, Ingo Bork, Bhardwaj Durvasula, Sayalee Gharat, Nageswara Rao, Ravi Pai, Sandeep Koranne, Alexander Tritchkov

JM3, Vol. 20, Issue 04, 041403, (November 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.4.041403

KEYWORDS: Photomasks, Tolerancing, Optical proximity correction, Semiconducting wafers, Manufacturing, Extreme ultraviolet, Vestigial sideband modulation, Extreme ultraviolet lithography, Scanning electron microscopy, Lithography

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Proceedings Article | 22 February 2021 Presentation + Paper

Curvilinear data format working group for MBMW era

Jin Choi, Soo Ryu, Sukho Lee, Minah Kim, JoonSoo Park, Buck Peter, Ingo Bork, Bhardwaj Durvasula, Sayalee Gharat, Nageswara Rao

Proceedings Volume 11610, 116100S (2021) https://doi.org/10.1117/12.2587109

KEYWORDS: Optical proximity correction, Mask making, Electronic design automation

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Proceedings Article | 26 September 2019 Paper

Requirements of data technology for EUV photomask

Jin Choi, Jonggul Doh, Minah Kim, Chan Uk Jeon

Proceedings Volume 11148, 111480F (2019) https://doi.org/10.1117/12.2538411

KEYWORDS: Photomasks, Extreme ultraviolet, Data corrections, Extreme ultraviolet lithography, Optical lithography, Lithography, Modulation, Data processing, Ecosystems

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Proceedings Article | 16 October 2017 Paper

Multi-beam mask writer MBM-1000

Hiroshi Matsumoto, Hideo Inoue, Hiroshi Yamashita, Ryosuke Ueba, Kenji Otoshi, Hirokazu Yamada, Jin Choi, Byoung-Sup Ahn, Jong-Mun Park, Sang-Hee Lee, Shuichi Tamamushi, Chan-Uk Jeon

Proceedings Volume 10451, 1045117 (2017) https://doi.org/10.1117/12.2280502

KEYWORDS: Photomasks, Computer aided design, Data processing, Modulation

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Proceedings Article | 3 October 2016 Paper

The technical consideration of multi-beam mask writer for production

Sang Hee Lee, Byung-Sup Ahn, Jin Choi, In Kyun Shin, Shuichi Tamamushi, Chan-Uk Jeon

Proceedings Volume 9985, 998506 (2016) https://doi.org/10.1117/12.2243129

KEYWORDS: Vestigial sideband modulation, Electron beam lithography, Optical simulations, Electron beams, Photomasks, Optical lithography, Distortion, Modulation, Neodymium, Image registration

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Proceedings Article | 22 March 2016 Paper

Requirements of the e-beam shot quality for mask patterning of the sub-1X device

Sinjeung Park, Jongmun Park, Boram Lee, Jin Choi, In Kyun Shin, Chan-Uk Jeon

Proceedings Volume 9777, 977716 (2016) https://doi.org/10.1117/12.2218340

KEYWORDS: Photomasks, Optical proximity correction, Electron beam lithography, Critical dimension metrology, Vestigial sideband modulation, Diamond patterning, Semiconducting wafers, Scanning electron microscopy, Optical lithography, Lithography

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Proceedings Article | 9 July 2015 Paper

Challenges and requirements of mask data processing for multi-beam mask writer

Jin Choi, Dong Hyun Lee, Sinjeung Park, SookHyun Lee, Shuichi Tamamushi, In Kyun Shin, Chan Uk Jeon

Proceedings Volume 9658, 96580C (2015) https://doi.org/10.1117/12.2199274

KEYWORDS: Photomasks, Data corrections, Optical proximity correction, Data processing, Data modeling, Scattering, Logic devices, Modulation, Laser scattering, Optical lithography

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Proceedings Article | 16 September 2014 Paper

Study of heating effect in multi-beam mask writing

Jongsu Kim, Jihoon Kang, Inhwan Noh, Sookhyun Lee, Soeun Shin, Sungil Lee, Hyunchung Ha, Hojune Lee, Jin Choi, Sanghee Lee, Inkyun Shin, Shuichi Tamamushi, Chan-Uk Jeon

Proceedings Volume 9235, 92350Y (2014) https://doi.org/10.1117/12.2065930

KEYWORDS: Finite element methods, Critical dimension metrology, Vestigial sideband modulation, Photomasks, Beam shaping, Chemical reactions, Electron beams, Heat flux, Chemical analysis, Thermal effects

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SPIE Journal Paper | 4 August 2014

Multi-image display system based on image magnifier by lens array

Jin Choi, Hong Jin Kong, Jong Ung Lee

OE, Vol. 53, Issue 08, 085102, (August 2014) https://doi.org/10.1117/12.10.1117/1.OE.53.8.085102

KEYWORDS: Image segmentation, Displays, Lens design, Imaging systems, Aspheric lenses, LCDs, Microlens array, Optical engineering, Optical arrays, Modulation transfer functions

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Proceedings Article | 28 July 2014 Paper

Challenges and technical requirements for multi-beam mask writer development

Sang Hee Lee, Jin Choi, Ho June Lee, In Kyun Shin, Shuichi Tamamushi, Chan-Uk Jeon

Proceedings Volume 9256, 925606 (2014) https://doi.org/10.1117/12.2069731

KEYWORDS: Photomasks, Vestigial sideband modulation, Electron beam lithography, Scattering, Laser scattering, Monte Carlo methods, Image processing, Backscatter, Beam controllers, Calibration

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SPIE Journal Paper | 5 May 2014

Optical design of a refractive beam shaper that transforms a Gaussian beam profile into a diverging uniform line beam profile

Jin Choi, Hong Jin Kong, Jong-Ung Lee

OE, Vol. 53, Issue 05, 055101, (May 2014) https://doi.org/10.1117/12.10.1117/1.OE.53.5.055101

KEYWORDS: Beam shaping, Beam propagation method, Diffraction, Gaussian beams, Optical design, Transform theory, Wavefronts, Wave propagation, Geometrical optics, Ray tracing

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SPIE Journal Paper | 25 April 2014

Computational technique to overcome the limit of a photomask writer

Jin Choi, In Kyun Shin, Chan-Uk Jeon

JM3, Vol. 13, Issue 02, 023002, (April 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.2.023002

KEYWORDS: Photomasks, Vestigial sideband modulation, Electron beam lithography, Data modeling, Optical proximity correction, Semiconducting wafers, Lithography, Manufacturing, Raster graphics, Beam shaping

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SPIE Journal Paper | 2 December 2013

Inverse e-beam lithography on photomask for computational lithography

Jin Choi, Ji Soong Park, In Kyun Shin, Chan-Uk Jeon

JM3, Vol. 13, Issue 01, 011003, (December 2013) https://doi.org/10.1117/12.10.1117/1.JMM.13.1.011003

KEYWORDS: Photomasks, Electron beam lithography, Computational lithography, Lithography, Manufacturing, Data modeling, Optical proximity correction, Vestigial sideband modulation, Semiconducting wafers, Model-based design

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Proceedings Article | 20 September 2013 Paper

Study of ion beam damage in magnetic tunnel junction on FIB prepared samples

Kwangho Park, Cheolwoong Yang, Kyuchul Kim, Dongwoo Nam, Kyuman Hwang, Junsoo Bae, Juhyeon Ahn, Jin Choi, Soonoh Park, Sangsup Jeong, Hanku Cho, Eunseung Jeong

Proceedings Volume 8819, 88190I (2013) https://doi.org/10.1117/12.2026767

KEYWORDS: Ion beams, Ions, Magnetism, Transmission electron microscopy, Silicon, Oxides, Semiconducting wafers, Resistance, Gallium, Ferromagnetics

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Proceedings Article | 12 April 2013 Paper

Manufacturability of computation lithography mask: current limit and requirements for sub-20nm node

Jin Choi, In-Yong Kang, Ji Soong Park, In Kyun Shin, Chan-Uk Jeon

Proceedings Volume 8683, 86830L (2013) https://doi.org/10.1117/12.2011341

KEYWORDS: Photomasks, Data modeling, Manufacturing, Lithography, Computational lithography, Optical proximity correction, Optical lithography, Semiconducting wafers, Electron beam lithography, Computer aided design

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Proceedings Article | 8 November 2012 Paper

An enhanced measure of mask quality using separated models

Anthony Adamov, Bob Pack, Kazuyuki Hagiwara, Ingo Bork, Jin Choi, Jissong Park, Byung-Gook Kim

Proceedings Volume 8522, 852207 (2012) https://doi.org/10.1117/12.964379

KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Monte Carlo methods, Quality measurement, Lithography, Optical proximity correction, Model-based design, Error analysis, Data modeling

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Proceedings Article | 8 November 2012 Paper

Improving CD uniformity using MB-MDP for 14nm node and beyond

Byung Kim, Jin Choi, Jisoong Park, Chan Jeon, Sterling Watson, Anthony Adamov, Bob Pack, Ingo Bork

Proceedings Volume 8522, 852205 (2012) https://doi.org/10.1117/12.966327

KEYWORDS: Photomasks, Semiconducting wafers, Monte Carlo methods, Data modeling, Critical dimension metrology, Backscatter, Model-based design, Modulation, SRAF, Lithography

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Proceedings Article | 14 October 2011 Paper

The requirements for the future e-beam mask writer: statistical analysis of pattern accuracy

Sang Hee Lee, Jin Choi, Hee Bom Kim, Byung Gook Kim, Han-Ku Cho

Proceedings Volume 8166, 81661B (2011) https://doi.org/10.1117/12.896977

KEYWORDS: Photomasks, Error analysis, Line edge roughness, Vestigial sideband modulation, Critical dimension metrology, Electron beam lithography, Inspection, Mask making, Image registration, Calibration

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Proceedings Article | 14 October 2011 Paper

Pattern placement error due to resist charging effect at 50kV e-beam writer: mechanism and its correction

Jin Choi, Suk Jong Bae, Hee Bom Kim, B. G. Kim, Han Ku Cho

Proceedings Volume 8166, 81661Z (2011) https://doi.org/10.1117/12.898856

KEYWORDS: Photomasks, Extreme ultraviolet, Scattering, Critical dimension metrology, Monte Carlo methods, Lithography, Electron beam lithography, Semiconducting wafers, Double patterning technology, Astatine

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Proceedings Article | 25 September 2010 Paper

Degradation of pattern quality due to strong electron scattering in EUV mask

Jin Choi, Rae Won Lee, Sang Hee Lee, Byung Sup Ahn, Hee Bom Kim, Sang-Gyun Woo, Han Ku Cho

Proceedings Volume 7823, 78230D (2010) https://doi.org/10.1117/12.864212

KEYWORDS: Photomasks, Extreme ultraviolet, Scattering, Monte Carlo methods, Ray tracing, Electron beam lithography, Molybdenum, Metals, Ion beams, Laser scattering

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Proceedings Article | 27 May 2010 Paper

A novel pattern error detecting algorithm for SEM images of mask monitoring patterns

Yoonna Oh, Jae-Pil Shin, Jin Choi, Jong-Bae Lee, Moon-Hyun Yoo

Proceedings Volume 7748, 77481L (2010) https://doi.org/10.1117/12.866273

KEYWORDS: Scanning electron microscopy, Photomasks, Inspection, Error analysis, Mask making, Binary data, Critical dimension metrology, Target detection, Edge detection

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Proceedings Article | 27 May 2010 Paper

Requirements of e-beam size and position accuracy for photomask of sub-32 nm HP device

Jin Choi, Sang Hee Lee, Hee Bom Kim, Byung Gook Kim, Sang-Gyun Woo, Han Ku Cho

Proceedings Volume 7748, 774819 (2010) https://doi.org/10.1117/12.868174

KEYWORDS: Photomasks, Critical dimension metrology, Electron beams, Lithography, Line edge roughness, Vestigial sideband modulation, Electron beam lithography, Optical proximity correction, Computational lithography, Extreme ultraviolet lithography

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Proceedings Article | 26 May 2010 Paper

Mask writing time explosion and its effect on CD control in e-beam lithography

Sang Hee Lee, Jin Choi, Seong Jun Min, Hee Bom Kim, Byung Gook Kim, Sang-Gyun Woo, Han-Ku Cho

Proceedings Volume 7748, 77480J (2010) https://doi.org/10.1117/12.868264

KEYWORDS: Photomasks, Electron beam lithography, Optical proximity correction, Optical simulations, Error analysis, Beam controllers, Mask making, Error control coding, Vestigial sideband modulation, Lithography

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Proceedings Article | 11 May 2009 Paper

Evaluation of an e-beam correction strategy for compensation of EUVL mask non-flatness

Kevin Orvek, Jaewoong Sohn, Jin Choi, Roxann Engelstad, Sudharshanan Raghunathan, John Zimmerman, Thomas Laursen, Yoshitake Shusuke, Tsutomu Shoki

Proceedings Volume 7379, 73790Q (2009) https://doi.org/10.1117/12.824267

KEYWORDS: Photomasks, Scanners, Semiconducting wafers, Extreme ultraviolet lithography, Finite element methods, Extreme ultraviolet, Polishing, Distortion, Overlay metrology, Optical alignment

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Proceedings Article | 11 May 2009 Paper

E-beam shot count estimation at 32 nm HP and beyond

Jin Choi, Sang Hee Lee, Dongseok Nam, Byung Gook Kim, Sang-Gyun Woo, Han Ku Cho

Proceedings Volume 7379, 737917 (2009) https://doi.org/10.1117/12.824284

KEYWORDS: Optical proximity correction, Photomasks, Semiconducting wafers, Lithography, Image processing, Line edge roughness, Edge roughness, Electron beam lithography, Critical dimension metrology, Vestigial sideband modulation

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Proceedings Article | 19 May 2008 Paper

Image placement error of photomask due to pattern loading effect: analysis and correction technique for sub-45 nm node

Jin Choi, Sang Hee Lee, Dongseok Nam, Byung Gook Kim, Sang-Gyun Woo, Han Ku Cho

Proceedings Volume 7028, 70281X (2008) https://doi.org/10.1117/12.793074

KEYWORDS: Photomasks, Etching, Image processing, Error analysis, Image registration, Electrons, Electron beam lithography, Lithography, Finite element methods, Critical dimension metrology

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Proceedings Article | 30 October 2007 Paper

Requirements of photomask registration for the 45nm node and beyond: Is it possible?

Jin Choi, Hee Bom Kim, Sang Hee Lee, Dong Hun Lee, Hae Young Jeong, Jeung Woo Lee, Byung Gook Kim, Sang-Gyun Woo, Han Ku Cho

Proceedings Volume 6730, 67301O (2007) https://doi.org/10.1117/12.746571

KEYWORDS: Photomasks, Image registration, Pellicles, Electron beam lithography, Finite element methods, Etching, Optical lithography, Positioning equipment, Error analysis, Distortion

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