The aim of this paper is to describe the design and simulation of an optical waveguide for its potential integration with
an optical source based on silicon rich oxide (SRO), on a silicon substrate. SRO deposited by Low Pressure Chemical
Vapor Deposition (LPCVD) has emission of light in the visible range, and then our goal is to integrate this optical source
with an appropriate optical waveguide. In this sense, we describe the methodology followed for the design of the optical
waveguide able to transmit light emitted in the wavelength range from 400 to 800 nm. Due to its optical properties and
compatibility with silicon technology the core material selected for the waveguide is silicon nitride (Si3N4), surrounded by silicon oxide (SiO2). The optimal dimensions and geometry that reduces losses and confine the light into the core zone are obtained by simulation.
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