Dr. James Oberschmidt Profile

Dr. James Oberschmidt

Engineer

SPIE Involvement:

Author

Publications (21)

Proceedings Article | 18 March 2015 Paper

Experiments using automated sample plan selection for OPC modeling

Ramya Viswanathan, Om Jaiswal, Nathalie Casati, Amr Abdo, James Oberschmidt, Josef Watts, Maria Gabrani

Proceedings Volume 9426, 94260W (2015) https://doi.org/10.1117/12.2086049

KEYWORDS: Statistical modeling, Surface plasmons, Calibration, Data modeling, Optical proximity correction, Metrology, Semiconducting wafers, Optical lithography, Integrated circuit design, Mathematical modeling

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Proceedings Article | 31 March 2014 Paper

Automated sample plan selection for OPC modeling

Nathalie Casati, Maria Gabrani, Ramya Viswanathan, Zikri Bayraktar, Om Jaiswal, David DeMaris, Amr Abdo, James Oberschmidt, Andreas Krause

Proceedings Volume 9052, 90520J (2014) https://doi.org/10.1117/12.2045461

KEYWORDS: Data modeling, Surface plasmons, Calibration, Optical proximity correction, Statistical modeling, Optical lithography, Process modeling, Printing, Image processing, Image quality

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Proceedings Article | 12 April 2013 Paper

Benchmarking study of 3D mask modeling for 2X and 1X nodes

ChangAn Wang, Chao-Chun Liang, Huikan Liu, Chidam Kallingal, Derren Dunn, James Oberschmidt, Jaione Tirapu Azpiroz

Proceedings Volume 8683, 86831A (2013) https://doi.org/10.1117/12.2011485

KEYWORDS: Photomasks, 3D modeling, Optical proximity correction, Performance modeling, Data modeling, Calibration, Critical dimension metrology, Metals, Error analysis, Diffraction

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Proceedings Article | 23 May 2011 Paper

Evaluation of process variations on OPC model predictions

James Oberschmidt, Samit Barai, Tamer Desouky, Om Prakash Jaiswal, Aditya Padmawar, Ramana Murthy Pusuluri

Proceedings Volume 8081, 80810O (2011) https://doi.org/10.1117/12.897531

KEYWORDS: Photomasks, Data modeling, Calibration, Critical dimension metrology, Optical proximity correction, Process modeling, Semiconducting wafers, Lithography, Polarization, Wafer-level optics

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Proceedings Article | 20 May 2011 Paper

Efficient method for SRAF rule determination

Ramana Murthy V. Pusuluri, Pavan Bashaboina, James Oberschmidt

Proceedings Volume 8081, 80810T (2011) https://doi.org/10.1117/12.899900

KEYWORDS: SRAF, Electronic design automation, Resolution enhancement technologies, Computer simulations, Current controlled current source

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Proceedings Article | 4 March 2010 Paper

Automation of sample plan creation for process model calibration

James Oberschmidt, Amr Abdo, Tamer Desouky, Mohamed Al-Imam, Azalia Krasnoperova, Ramya Viswanathan

Proceedings Volume 7640, 76401G (2010) https://doi.org/10.1117/12.846276

KEYWORDS: Calibration, Process modeling, Statistical modeling, Data modeling, Photoresist processing, Lithography, Computer simulations, Image processing, Metrology, Optical proximity correction

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Proceedings Article | 16 March 2009 Paper

Improving yield through the application of process window OPC

Jaione Tirapu Azpiroz, Azalia Krasnoperova, Shahab Siddiqui, Kenneth Settlemyer, Ioana Graur, Ian Stobert, James Oberschmidt

Proceedings Volume 7274, 727411 (2009) https://doi.org/10.1117/12.811868

KEYWORDS: Optical proximity correction, Semiconducting wafers, Photomasks, Tolerancing, Lithography, Photoresist processing, Algorithm development, Critical dimension metrology, Yield improvement, Computer simulations

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Proceedings Article | 17 October 2008 Paper

Improvements in accuracy of dense OPC models

Chidam Kallingal, James Oberschmidt, Ramya Viswanathan, Amr Abdo, OSeo Park

Proceedings Volume 7122, 71221Q (2008) https://doi.org/10.1117/12.801695

KEYWORDS: Optical proximity correction, Diffusion, Data modeling, Optimization (mathematics), Calibration, Critical dimension metrology, Cadmium, Semiconducting wafers, Model-based design, Photoresist processing

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Proceedings Article | 2 April 2008 Paper

The comparison of OPC performance and run time for dense versus sparse solutions

Amr Abdo, Ian Stobert, Ramya Viswanathan, Ryan Burns, Klaus Herold, Chidam Kallingal, Jason Meiring, James Oberschmidt, Scott Mansfield

Proceedings Volume 6924, 69243G (2008) https://doi.org/10.1117/12.772902

KEYWORDS: Optical proximity correction, Data modeling, Scanning electron microscopy, Computer simulations, Calibration, Performance modeling, Resolution enhancement technologies, Semiconducting wafers, Lithography, Wafer-level optics

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Proceedings Article | 22 March 2008 Paper

Challenges of implementing contour modeling in 32nm technology

Daniel Fischer, Geng Han, James Oberschmidt, Yong Wah Cheng, Jae Yeol Maeng, Charles Archie, Wei Lu, Cyrus Tabery

Proceedings Volume 6922, 69220A (2008) https://doi.org/10.1117/12.775444

KEYWORDS: Calibration, Scanning electron microscopy, Metrology, Optical proximity correction, Critical dimension metrology, Cadmium, Data modeling, Line edge roughness, Tolerancing, Systems modeling

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Proceedings Article | 20 October 2006 Paper

The effect of OPC optical and resist model parameters on the model accuracy, run time, and stability

Amr Abdo, Rami Fathy, Ahmed Seoud, James Oberschmidt, Scott Mansfield, Mohamed Talbi

Proceedings Volume 6349, 634923 (2006) https://doi.org/10.1117/12.686093

KEYWORDS: Optical proximity correction, Data modeling, Performance modeling, Diffusion, Optics manufacturing, Scanning electron microscopy, Model-based design, Calibration, Apodization, Optical lithography

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Proceedings Article | 24 March 2006 Paper

Model-based calculation of weighting in OPC model calibration

Mohamed Talbi, Amr Abdo, Daniel Fischer, Geng Han, Scott Mansfield, James Oberschmidt, Ramya Viswanathan

Proceedings Volume 6152, 615202 (2006) https://doi.org/10.1117/12.656568

KEYWORDS: Optical proximity correction, Data modeling, Calibration, Scanning electron microscopy, Statistical modeling, Model-based design, Error analysis, Metrology, Statistical analysis, Computer simulations

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Proceedings Article | 9 November 2005 Paper

The effect of calibration feature weighting on OPC optical and resist models: investigating the influence on model coefficients and on the overall model fitting

Amr Abdo, Rami Fathy, Kareem Madkour, James Oberschmidt, Daniel Fischer, Mohamed Talbi

Proceedings Volume 5992, 599253 (2005) https://doi.org/10.1117/12.631817

KEYWORDS: Calibration, Optical proximity correction, Data modeling, Process modeling, 3D modeling, Optimization (mathematics), Model-based design, Photoresist processing, Integrated circuits, Optical lithography

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Proceedings Article | 8 November 2005 Paper

Impact of mask CD error on OPC performance for 65nm technology M1 level

Oseo Park, James Oberschmidt, Wai-Kin Li

Proceedings Volume 5992, 59922Q (2005) https://doi.org/10.1117/12.630758

KEYWORDS: Photomasks, Optical proximity correction, Semiconducting wafers, Calibration, Distortion, Critical dimension metrology, SRAF, Lithography, Diffusion, Apodization

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Proceedings Article | 26 June 2003 Paper

Failure prediction across process window for robust OPC

Shumay Shang, Yuri Granik, Nicolas Cobb, Wilhelm Maurer, Yuping Cui, Lars Liebmann, James Oberschmidt, Rama Singh, Ben Vampatella

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485478

KEYWORDS: Optical proximity correction, Data modeling, Printing, Image processing, Visualization, Calibration, Binary data, Solids, Failure analysis, Process modeling

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Proceedings Article | 26 July 1999 Paper

Alternating phase-shifted mask for logic gate levels, design, and mask manufacturing

Lars Liebmann, Ioana Graur, William Leipold, James Oberschmidt, David O'Grady, Denis Regaill

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354344

KEYWORDS: Photomasks, Manufacturing, Inspection, Phase shifts, Lithography, Computer aided design, Etching, Design for manufacturability, Semiconducting wafers, Logic devices

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Proceedings Article | 7 July 1997 Paper

New ESCAP-type resist with enhanced etch resistance and its application to future DRAM and logic devices

Will Conley, William Brunsvold, Fred Buehrer, Ronald DellaGuardia, David Dobuzinsky, Timothy Farrell, Hok Ho, Ahmad Katnani, Robin Keller, James Marsh, Paul Muller, Ronald Nunes, Hung Ng, James Oberschmidt, Michael Pike, Deborah Ryan, Tina Cotler-Wagner, Ron Schulz, Hiroshi Ito, Donald Hofer, Gregory Breyta, Debra Fenzel-Alexander, Gregory Wallraff, Juliann Opitz, James Thackeray, George Barclay, James Cameron, Tracy Lindsay, Michael Cronin, Matthew Moynihan, Sassan Nour, Jacque Georger, Mike Mori, Peter Hagerty, Roger Sinta, Thomas Zydowsky

Proceedings Volume 3049, (1997) https://doi.org/10.1117/12.275830

KEYWORDS: Semiconducting wafers, Photoresist materials, Etching, Polymers, Resistance, Lithography, Silicon, Glasses, Annealing, Photoresist processing

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Proceedings Article | 27 May 1996 Paper

X-ray exposure in the manufacture of sub-150-nm gate lines

Angela Lamberti, Paul Agnello, Emmanuel Crabbe, Ronald DellaGuardia, James Oberschmidt, Seshu Subbana, Steve Wu

Proceedings Volume 2723, (1996) https://doi.org/10.1117/12.240475

KEYWORDS: Photomasks, Semiconducting wafers, X-rays, Optical alignment, X-ray lithography, X-ray optics, Lithography, Photoresist materials, Real-time computing, Picosecond phenomena

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Proceedings Article | 19 May 1995 Paper

Electrical linewidth measurements and simulations studying the effect of dose and gap on exposure latitude in x-ray lithography

Christine Nelson, Scott Hector, William Chu, Philip Seese, Matthew Thompson, Victor Pol, Mark McCord, James Oberschmidt, James Taylor

Proceedings Volume 2437, (1995) https://doi.org/10.1117/12.209161

KEYWORDS: Etching, Scanning electron microscopy, Semiconducting wafers, X-ray lithography, Photomasks, Resistance, Metrology, Lithography, Synchrotrons, Reactive ion etching

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Proceedings Article | 13 May 1994 Paper

Overlay measurement and analysis of x-ray/optical lithography for mix-and-match device applications

Arnold Yanof, Kevin Cummings, Philip Seese, Matthew Thompson, Mark Drew, Daniel DeMay, James Oberschmidt, Robert Fair, Angela Lamberti

Proceedings Volume 2194, (1994) https://doi.org/10.1117/12.175807

KEYWORDS: X-rays, Semiconducting wafers, Photomasks, Wafer-level optics, Optical alignment, X-ray optics, Distortion, Overlay metrology, Metrology, X-ray lithography

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Proceedings Article | 9 July 1992 Paper

Design of synchrotron x-ray lithography beamlines

James Oberschmidt, Robert Rippstein, Raymond Ruckel, Alek Chen, John Granlund, Alfred Palumbo

Proceedings Volume 1671, (1992) https://doi.org/10.1117/12.136017

KEYWORDS: Mirrors, Beryllium, Synchrotrons, Control systems, X-ray lithography, Lithography, Camera shutters, Semiconducting wafers, Light sources, Photomasks

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Showing 5 of 21 publications

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